Hitachi High-Tech Science Corporation

Tsuyoshi Oonishi

Toshiyuki Iwahori

Satoshi Tomimatsu

Hiroki Kawada

Hideo Sakai

A focused ion beam apparatus includes a sample tray on which a sample is placed, and a focused ion beam column for irradiating the sample with a focused ion beam to obtain a micro sample-piece. A sample chamber contains therein the sample tray and the focused ion beam column. A side-entry-type carrier is inserted into and removed from the sample chamber, with a front end side of the carrier holding the sample-piece. A sample-piece moving unit moves the sample-piece between the sample tray and the carrier. The sample tray is movable along at least x, y, and z axes, and an end of the sample tray is provided with a carrier engagement part releasably engageable with the carrier so that movement of the sample tray is accompanied by corresponding movement of the carrier.

Focused ion beam apparatus

Shaft members which respectively protrude toward at least one beam member and the other beam member in a z-axis direction are formed in a mesh support member. A through hole for penetrating a space between a shaft end surface and an opening portion in the z-axis direction and introducing a focused ion beam toward a fine sample piece is formed in at least one shaft member.

Sample holder and focused ion beam apparatus

There is provided a control device for controlling a charged particle beam apparatus, wherein the beam apparatus comprises a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit, and the control device comprises an angle calculation unit that based on a direction of a first processing in which a processed surface having a normal line not parallel to any of the turning axes is generated in the workpiece by the irradiation unit and a direction of a second processing to be processed by the irradiation unit from a direction different from the direction of the first processing with respect to the processed surface to be generated by the first processing, calculates turning angles about the turning axes that changes the direction of the stage from the direction of the first processing to the direction of the second processing.

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Tokyo, Japan

Tsuyoshi Oonishi