Xintec Corporation

Other

Tsang-Yu Liu

Yen-Shih Ho

Shu-Ming Chang

Chia-Sheng Lin

Chien-Hui Chen

Yu-Lung Huang

Chia-Ming Cheng

Yu-Lin Yen

Wei-Luen Suen

Po-Han Lee

Yi-Ming Chang

Long-Sheng Yeou

Wei-Ming Chien

Chi-Chang Liao

Chaung-Lin Lai

Hsing-Lung Shen

Hung-Jen Lee

Ying-Nan Wen

Po-Shen Lin

Yu-Ting Huang

Chuan-Jin Shiu

Chao-Yen Lin

Jiun-Yen Lai

Kuei-Wei Chen

Chen-Han Chiang

Hui-Hsien Wu

Chun-Wei Chang

Bai-Yao Lou

Chih-Wei Ho

Ming-Kun Yang

Jian-Hong Chen

Chia-Lun Tsai

Ho-Yin Yiu

Tzu-Hsiang Hung

Hsin Kuan

Yi-Min Lin

Yung-Tai Tsai

Yao-Hsiang Chen

Chia-Lun Shen

Chien-Hung Liu

Shih-Ming Chen

Yu-min Liang

Shang-Yi Wu

Hsi-Chien Lin

Bing-Siang Chen

Kuo-Hua Liu

Tzu-Wen Tseng

Shih-Hsing Chan

Ching-Jui Chuang

Tzu-Min Chen

Ta-Hsuan Lin

Po-Chang Huang

A chip package includes a semiconductor substrate and a metal layer. The semiconductor substrate has an opening and a sidewall surrounding the opening, in which an upper portion of the sidewall is a concave surface. The semiconductor substrate is made of a material including silicon. The metal layer is located on the semiconductor substrate. The metal layer has plural through holes above the opening to define a MEMS (Microelectromechanical system) structure, in which the metal layer is made of a material including aluminum.

Chip package

Chip packages and methods for forming the same are provided. The method includes providing a substrate having a chip region and a scribe-line region surrounding the chip region and forming a dielectric layer on an upper surface of the substrate. A dummy structure is formed in the dielectric layer over the scribe-line region of the substrate and extends along edges of the chip region. The dummy structure includes a first stack of dummy metal layers and a second stack of dummy metal layers arranged concentrically from the inside to the outside. The method also includes performing a sawing process on a portion of the dielectric layer that surrounds the dummy structure, so as to form a saw opening through the dielectric layer. At least the first stack of dummy metal layers remains in the dielectric layer after the sawing process is performed.

Chip package and method for forming a chip package having first and second stack of dummy metal layers surround the sensing region

Chip packages and methods for forming the same are provided. The method includes providing a substrate having upper and lower surfaces, and having a chip region and a scribe-line region surrounding the chip region. The substrate has a dielectric layer on its upper surface. A masking layer is formed over the substrate to cover the dielectric layer. The masking layer has a first opening exposing the dielectric layer and extending in the extending direction of the scribe-line region to surround the chip region. An etching process is performed on the dielectric layer directly below the first opening, to form a second opening that is in the dielectric layer directly below the first opening. The masking layer is removed to expose the dielectric layer having the second opening. A dicing process is performed on the substrate through the second opening.

Chip package and method for forming the same

A manufacturing method of a chip package includes patterning a wafer to form a scribe trench, in which a light-transmissive function layer below the wafer is in the scribe trench, the light-transmissive function layer is between the wafer and a carrier, and a first included angle is formed between an outer wall surface and a surface of the wafer facing the light-transmissive function layer; cutting the light-transmissive function layer and the carrier along the scribe trench to form a chip package that includes a chip, the light-transmissive function layer, and the carrier; and patterning the chip to form an opening, in which the light-transmissive function layer is in the opening, a second included angle is formed between an inner wall surface of the chip and a surface of the chip facing the light-transmissive function layer, and is different from the first included angle.

Manufacturing method of chip package and chip package

Chip package and manufacturing method thereof

A chip package includes a first die, a second die, a molding material, and a redistribution layer. The first die includes a first conductive pad. The second die is disposed on the first die and includes a second conductive pad. The molding material covers the first die and the second die. The molding material includes a top portion, a bottom portion, and an inclined portion adjoins the top portion and the bottom portion. The top portion is located on the second die, and the bottom portion is located on the first die. The redistribution layer is disposed along the top portion, the inclined portion, and the bottom portion. The redistribution layer is electrically connected to the first conductive pad and the second conductive pad.

A manufacturing method of a chip package includes forming a temporary bonding layer on a carrier; forming an encapsulation layer on a top surface of a wafer or on the temporary bonding layer; bonding the carrier to the wafer, in which the encapsulation layer covers a sensor and a conductive pad of the wafer; patterning a bottom surface of the wafer to form a through hole, in which the conductive pad is exposed through the through hole; forming an isolation layer on the bottom surface of the wafer and a sidewall of the through hole; forming a redistribution layer on the isolation layer and the conductive pad that is in the through hole; forming a passivation layer on the isolation layer and the redistribution layer; and removing the temporary bonding layer and the carrier.

Manufacturing method of chip package

A chip package includes a high voltage withstanding substrate and a device chip. The high voltage withstanding substrate has a main body, a functional layer, and a grounding layer. The main body has a top surface, a bottom surface opposite the top surface, a through hole through the top surface and the bottom surface, and a sidewall surrounding the through hole. The functional layer is located on the top surface. The grounding layer covers the bottom surface and the sidewall. The device chip is located on the functional layer, and has a grounding pad that faces the main body. The grounding pad is electrically connected to the grounding layer in the through hole.

Chip package and power module

An optical chip package is provided. The optical chip package includes a first transparent substrate, a second transparent substrate, and a spacer layer. The first and second transparent substrates each has a first surface and a second surface opposite the first surface. The first transparent substrate has a thickness that is different than that of the second transparent substrate. The second transparent substrate is disposed over the first transparent substrate, and the spacer layer is bonded between the second surface of the first transparent substrate and the first surface of the second transparent substrate. The recess region extends from the second surface of the second transparent substrate into the first transparent substrate, so that the first transparent substrate has a step-shaped sidewall. A method of forming an optical chip package is also provided.

Optical chip package and method for forming the same

A chip package includes a lower substrate, a first silicon nitride substrate, a bonding layer, an upper substrate, a first functional layer, a transparent conductive layer, an isolation layer, and a first conductive pad. The supporting layer is located between the lower substrate and the first silicon nitride substrate, and is made of a material including Benzocyclobutene (BCB). The upper substrate is located on the first silicon nitride substrate. The first functional layer is located between the upper substrate and the first silicon nitride substrate. The transparent conductive layer is located on the upper substrate. The isolation layer covers the upper substrate and the transparent conductive layer. The first conductive pad is located in the isolation layer and in electrical contact with the transparent conductive layer.

A chip package is provided. the chip package includes a substrate having an upper surface, a lower surface, and a sidewall surface that is at an edge of the substrate. The substrate includes a sensing device adjacent to the upper surface of the substrate to sense a light source. The chip package also includes a first color filter layer disposed on the upper surface of the substrate to shield the light source. The first color filter layer includes an opening, so that the first color filter layer surrounds the sensing device via the opening. In addition, the chip package includes a redistribution layer disposed on the lower surface of the substrate. A method of forming the chip package is also provided.

A manufacturing method of a chip package includes the following steps. A light transmissive substrate is bonded to a first surface of a wafer, such that a dam element between the light transmissive substrate and the wafer covers a conductive pad of the wafer. A second surface of the wafer facing away from the first surface is etched, such that a hollow region and a trench selectively communicated with the hollow region are synchronously formed in the wafer. A first isolation layer on the conductive pad is etched to expose the conductive pad through the hollow region.

Growing community of inventors

Zhubei, Taiwan

Tsang-Yu Liu