Applied Materials, Inc.

Troy Kim

Shankar Venkataraman

Ju-Hyung Lee

Maosheng Zhao

Li-Qun Xia

Juan Carlos Rocha-Alvarez

Mei-Yee Shek

Annamalai Lakshmanan

Inna Shmurun

Ritwik Bhatia

Lun Tsuei

Soovo Sen

Vladamir Zubkov

A method of forming a sidewall spacer on a gate electrode is described. The method includes generating a first plasma from a silicon containing precursor and oxide precursor, and forming a silicon oxy-nitride layer on the sidewall of the gate electrode. The method also includes generating a second plasma from the silicon containing precursor and a nitrogen precursor, and forming a nitride layer on the silicon oxy-nitride layer. The silicon containing precursor can flow continuously between the generation of the first and the second plasmas. Also, a method of forming a sidewall spacer on the side of a gate electrode on a substrate. The method includes forming an oxy-nitride layer on the sidewall, and forming a nitride layer on the oxy-nitride layer, where the substrate wafer is not exposed to air between the formation of the layers.

Boron diffusion barrier by nitrogen incorporation in spacer dielectrics

An apparatus for distributing gas in a processing system. In one embodiment, the system includes a gas distribution assembly having a gas distribution plate. The gas distribution plate defines a plurality of holes through which gases are transmitted. The assembly further includes a gas box coupled to the gas distribution plate, in which the gas box is configured to supply the gases into the plurality of holes. The assembly further includes a means for reducing heat transfer from the gas box to the gas distribution plate.

Heated gas distribution plate for a processing chamber

A method and apparatus for cleaning a processing chamber are provided. The cleaning method includes the use of a remote plasma source to generate reactive species and an in situ RF power to generate or regenerate reactive species. The reactive species are generated from a carbon and fluorine-containing gas and an oxygen source.

Cleaning of CVD chambers using remote source with cxfyoz based chemistry

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Mountain View, CA, United States of America

Troy Kim