Tokyo Electron Limited

Tomohiko Muta

Daisuke Ishimaru

Takashi Sasa

Katsunori Ichino

Akiko Kai

Takahiro Okubo

Kenji Adachi

Daiki Shibata

Masayuki Kajiwara

Makoto Ogata

Tomoyuki Yumoto

Hiroki Okaguchi

Takeaki Sakamoto

Tetsuro Iriyama

Masato Imamura

Atsushi Yamamoto

Takuya Tajiri

A tank includes a container part having an upper wall, a sidewall and a bottom wall to store a processing liquid therein, a liquid discharge passage installed at a position higher than a liquid surface of the processing liquid stored in the container part to discharge the processing liquid into the container part, and a gas discharge passage installed at a position higher than the liquid surface to discharge a gas into the container part. The liquid discharge passage discharges the processing liquid from the liquid discharge port so that the processing liquid is brought into contact with a portion above the liquid surface of an inner surface of the sidewall. The gas discharge passage discharges the gas from the gas discharge port so that the gas is brought into contact with a portion above the liquid surface of an inner surface of the container part.

Tank, substrate processing apparatus, and method of using the tank

A substrate processing apparatus includes a discharge part including a nozzle configured to discharge a processing liquid onto a substrate; a liquid feeder configured to feed the processing liquid to the discharge part; a replenishment part configured to replenish the liquid feeder with the processing liquid to be fed to the discharge part; a connector including a switching valve configured to open/close a flow path between the replenishment part and the liquid feeder; a filter configured to remove foreign matters contained in the processing liquid; a replenishment preparation part configured to open the switching valve after reducing a pressure difference between the inside of the replenishment part and the liquid feeder; and a replenishment controller configured to start replenishment of the processing liquid from the replenishment part to the liquid feeder in a state in which the switching valve is opened by the replenishment preparation part.

Substrate processing apparatus, control method, and computer-readable storage medium

A stay of a liquid can be suppressed. A pumpincludes a tube, having elasticity, in which a liquid as a target to be delivered flows; a tube housingwhich covers an outside of the tubeand keeps a gas in an inner space V between an outer surface of the tubeand the tube housing; and an electropneumatic regulator RE configured to supply the gas into the inner space V and discharge the gas from the inner space V.

Pump, pump device, and liquid supply system

Growing community of inventors

Koshi, Japan

Tomohiko Muta