Carl Zeiss Smt Gmbh

Tilmann Assmus

Ulrich Loering

Vladimir Kamenov

Franz-Josef Stickel

Oliver Dier

Siegfried Rennon

Juergen Mueller

Tobias Hackl

A mirror () for EUV lithography includes a substrate () and a reflective coating (). The reflective coating has a first group () of layers () and a second group () of layers (), wherein the first group and second group of layers () reflect radiation having a used wavelength between 5 nm and 30 nm. The first group of layers is arranged between the substrate and the second group of layers, and a decoupling coating () is arranged between the first group and second group of layers, said decoupling coating optically decoupling the second group of layers from the first group of layers by preventing the radiation having the used wavelength from reaching the first group of layers. The reflective coating preferably has a correction layer () having a layer thickness variation for correcting the surface form of the mirror.

Surface correction of mirrors with decoupling coating

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Aalen, Germany

Tilmann Assmus