Kla Corporation

Tianhan Wang

Andrei V Shchegrov

Stilian Pandev

Alexander Kuznetsov

Qiang Zhao

Zhengquan Tan

Houssam Chouaib

Torsten Rudolf Kaack

Liequan Lee

Dawei Hu

Ming Di

Aaron J Rosenberg

Manh Dang Nguyen

John Lesoine

A spectroscopic metrology system includes a spectroscopic metrology tool and a controller. The controller generates a model of a multilayer grating including two or more layers, the model including geometric parameters indicative of a geometry of a test layer of the multilayer grating and dispersion parameters indicative of a dispersion of the test layer. The controller further receives a spectroscopic signal of a fabricated multilayer grating corresponding to the modeled multilayer grating from the spectroscopic metrology tool. The controller further determines values of the one or more parameters of the modeled multilayer grating providing a simulated spectroscopic signal corresponding to the measured spectroscopic signal within a selected tolerance. The controller further predicts a bandgap of the test layer of the fabricated multilayer grating based on the determined values of the one or more parameters of the test layer of the fabricated structure.

Bandgap measurements of patterned film stacks using spectroscopic metrology

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Milpitas, CA, United States of America

Tianhan Wang