Motorola Corporation

Thomas R Baker

David A Shumate

Bernard W Boland

George F Anderson

Robert W Gray

A sputter chamber with a rotatably mounted cathode nested in spacers, formed of the material sold under the trademark Teflon, and a quartz plate defining wafer receiving openings therethrough and affixed to the flat upper surface of the cathode in overlying relationship with the cathode and any exposed spacers to prevent sputtering of the spacers. If the material sold under the Trademark Teflon is sputtered fluorine containing ions are produced in the chamber plasma, which chemically etch masking materials such as titanium tungsten.

Sputter chamber with extended protection plate and method of use

A substantially planar dielectric wafer is formed by utilizing a polysilicon filler to remove surface irregularities (15, 15'). The polysilicon filler is formed by filling surface irregularities (15, 15') with polysilicon (19) and polishing the polysilicon (19) to form a substantially planar surface. A polishing stop (18) terminates the polishing and prevents damage to the wafer's isolated tubs (13). The polishing stop (18) can also be used as a mask during field oxide growth. The polysilicon filler also protects underlying areas (12) from subsequent etch operations. During subsequent field oxide growth, polysilicon layer (19) is converted to silicon dioxide which enhances dielectric isolation of each tub (13).

Planar dielectric isolated wafer

A bonding pad is described having a reduced surface area while maintaining adequate wire bonding surface. The bonding pad comprises: a test pad for contacting with a test probe; a plurality of radially extending conductive fingers; and an alignment key generally in the form of a circle disposed about a portion of the fingers.

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Tempe, AZ, United States of America

Thomas R Baker