Infineon Technologies Austria Ag

Infineon Technologies Ag

Thomas Feil

Martin Poelzl

Maximilian Roesch

Carsten Von Koblinski

Paul Ganitzer

Sylvain Leomant

Bernhard Goller

Robert Paul Haase

Danny Clavette

Gerald Lackner

Jochen Mueller

Tobias Polster

Andreas Peter Meiser

Oliver Blank

Michael Hutzler

Ravi Keshav Joshi

Gerhard Noebauer

Britta Wutte

Ashita Mirchandani

Yulia Polak

Wei-Chun Huang

The disclosure relates to a semiconductor die, including a vertical power transistor device, a pull-down transistor device, and a capacitor. The pull-down transistor device is connected between a gate electrode of the vertical power transistor device and a ground terminal and connects the gate electrode to the ground terminal in a conducting state. The capacitor is connected between one of the load terminals of the vertical power transistor device and the control terminal of the pull-down transistor device and capacitively couples the one load terminal to the control terminal.

Semiconductor die with a vertical transistor device

The disclosure relates to a semiconductor die with a transistor device, having a source region, a drain region, a body region including a channel region, a gate region, which includes a gate electrode, next to the channel region, for controlling a channel formation, a drift region between the channel region and the drain region, and a field electrode region with a field electrode formed in a field electrode trench, which extends into the drift region, wherein the channel region extends laterally and is aligned vertically with the gate region, and wherein at least a portion of the channel region is arranged vertically above the field electrode region.

Semiconductor die with a transistor device and method of manufacturing the same

In an embodiment, a semiconductor package includes a first transistor device having first and second opposing surfaces, a first power electrode and a control electrode arranged on the first surface and a second power electrode arranged on the second surface. A first metallization structure arranged on the first surface includes a plurality of outer contact pads which includes a protective layer of solder, Ag or Sn. A second metallization structure is arranged on the second surface. A conductive connection extending from the first surface to the second surface electrically connects the second power electrode to an outer contact pad of the first metallization structure. A first epoxy layer arranged on side faces and on the first surface of the transistor device includes openings which define a lateral size of the plurality of outer contact pads and a package footprint.

Semiconductor package and methods of manufacturing a semiconductor package

A semiconductor device includes: a semiconductor substrate having opposing first and second main surfaces; a plurality of transistor cells each including a source region, a drift zone, a body region separating the source region from the drift zone, a field plate trench extending into the drift zone and including a field plate, and a planar gate on the first main surface and configured to control current through a channel of the body region; a drain region at the second main surface; and a diffusion barrier structure including alternating layers of Si and oxygen-doped Si and a Si capping layer on the alternating layers of Si and oxygen-doped Si. The diffusion barrier structure may be interposed between body regions of adjacent transistor cells and/or extend along the channel of each transistor cell and/or vertically extend in the semiconductor substrate between adjacent field plate trenches.

Planar gate semiconductor device with oxygen-doped Si-layers

An electronic component includes a semiconductor device including a semiconductor die including a first surface, the first surface including a first metallization structure and edge regions surrounding the first metallization structure, a second surface opposing the first surface and including a second metallization structure, and side faces extending between the first surface and the second surface, wherein the edge regions of the first surface and portions of the side faces are covered by a first polymer layer, wherein the electronic component further includes a plurality of leads and a plastic housing composition, wherein the first metallization structure is coupled to a first lead and the second metallization structure is coupled to a second lead of the plurality of leads.

Composite wafer, semiconductor device and electronic component

Disclosed is a transistor device which includes a semiconductor body having a first surface, a source region, a drift region, a body region being arranged between the source region and the drift region, a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric, and a field electrode adjacent the drift region and dielectrically insulated from the drift region by a field electrode dielectric, wherein the field electrode comprises a first layer and a second layer, wherein the first layer has a lower electrical resistance than the second layer, wherein a portion of the second layer is disposed above and directly contacts a portion of the first layer.

Transistor device with a field electrode that includes two layers

A semiconductor transistor device is described that has a source region, a body region including a vertical channel region, a drain region, a gate region laterally aside the channel region, a body contact region formed by doping, a diffusion barrier layer, and a conductive region formed of a conductive material. The body contact region electrically contacts the body region, the diffusion barrier layer being arranged in between. The doping of the body contact region is of the same conductivity type but of higher concentration than a doping of the body region. The conductive region has a contact area that forms an electrical contact to the body contact region, the contact area of the conductive region being arranged vertically above an upper end of the channel region. A method for manufacturing the semiconductor transistor device is also described.

Semiconductor transistor device and method of manufacturing the same

In an embodiment, a composite semiconductor substrate includes a first polymer layer and a plurality of semiconductor dies having a first surface, a second surface opposing the first surface, side faces extending between the first surface and the second surface and a first metallization structure on the first surface. Edge regions of the first surface and at least portions of the side faces are embedded in the first polymer layer. At least one metallic region of the first metallization structure is exposed from the first polymer layer. A second metallization structure is arranged on the second surface of the plurality of semiconductor dies. A second polymer layer is arranged on edge regions of the second surface of the plurality of semiconductor dies and on the first polymer layer in regions between the side faces of neighbouring ones of the plurality of semiconductor dies.

Disclosed is an electronic circuit. The electronic circuit includes a first transistor device and a clamping circuit. The first transistor device includes a control node and a load path between a first load node and a second load node, and the clamping circuit includes a second transistor device and a drive circuit. The second transistor device includes a control node and a load path connected in parallel with the load path of the first transistor device, and the drive circuit includes a capacitor coupled between the second load node of the first transistor device, and a first resistor coupled between the control node of the second transistor device and a further circuit node.

Electronic circuit with a transistor device and a clamping circuit

In an embodiment, a module includes a first electronic device in a first device region and a second electronic device in a second device region. The first electronic device is operably coupled to the second electronic device to form a circuit. Side faces of the first electronic device and of the second electronic device are embedded in, and in direct contact with, a first epoxy layer.

Semiconductor module, electronic component and method of manufacturing a semiconductor module

A semiconductor device includes a trench extending into a first main surface of a semiconductor substrate, and a gate electrode and a gate dielectric in the trench. The gate dielectric separates the gate electrode from the semiconductor substrate. A first region having a first conductivity type is formed in the semiconductor substrate at the first surface adjacent the trench. A second region having a second conductivity type is formed in the semiconductor substrate below the first region adjacent the trench. A third region having the first conductivity type is formed in the semiconductor substrate below the second region adjacent the trench. A contact opening in the semiconductor substrate extends into the second region. An electrically insulative spacer is disposed on sidewalls of the semiconductor substrate formed by the contact opening, and an electrically conductive material in the contact opening adjoins the electrically insulative spacer on the sidewalls.

Semiconductor device having body contacts with dielectric spacers and corresponding methods of manufacture

Disclosed is a transistor device which includes a semiconductor body having a first surface, a source region, a drift region, a body region being arranged between the source region and the drift region, a gate electrode adjacent the body region and dielectrically insulated from the body region by a gate dielectric, and a field electrode adjacent the drift region and dielectrically insulated from the drift region by a field electrode dielectric. The field electrode includes a first layer and a second layer. The second layer includes a different conductive material as the first layer. A portion of the second layer is disposed above and directly contacts a portion of the first layer.

A semiconductor device includes: a gate trench extending into a Si substrate; a body region in the Si substrate, the body region including a vertical channel region adjacent a sidewall of the gate trench; a source region in the Si substrate above the body region; a contact trench extending into the Si substrate and separated from the gate trench by a portion of the source region and by a portion of the body region; an electrically conductive material in the contact trench; and a diffusion barrier structure interposed between a sidewall of the contact trench and the vertical channel region, the diffusion barrier structure including alternating layers of Si and oxygen-doped Si and configured to increase carrier mobility within the vertical channel region. Corresponding methods of manufacture are also described.

Vertical power devices with oxygen inserted Si-layers

A semiconductor device includes: a gate trench extending into a Si substrate; a body region in the Si substrate adjacent the gate trench; a source region in the Si substrate above the body region; a diffusion barrier structure adjacent a sidewall of the gate trench, the diffusion barrier structure including alternating layers of Si and oxygen-doped Si and a Si capping layer on the alternating layers of Si and oxygen-doped Si; and a channel region formed in the Si capping layer and which vertically extends along the sidewall of the gate trench. Corresponding methods of manufacture are also described.

Growing community of inventors

Villach, Austria

Thomas Feil