Hitachi, Ltd.

Hitachi High-tech Corporation

Teruo Kohashi

Hideo Morishita

Junichi Katane

Ken Harada

Ryoko Araki

Hiroyasu Shichi

Hiroyuki Yamamoto

Takashi Ohshima

Toshihide Agemura

Shinichi Matsubara

Masaki Hasegawa

Hirokazu Nishida

Takao Matsumoto

Tatsuro Ide

Tomohiro Iwane

Jun Xie

To implement a charged particle beam device including an iron thin film spin detector. The charged particle beam device includes: a charged particle columnconfigured to perform scanning on a samplewith a charged particle beam; a spin detector including an iron thin film, a plurality of coilsconfigured to magnetize the iron thin film, a conveying lensconfigured to focus, on the iron thin film, secondary electronsemitted from the sample due to irradiation of the charged particle beam, and an electron detectorconfigured to detect backscattered electronsemitted due to the iron thin film being irradiated with the secondary electrons; and a control unitconfigured to control switching of a magnetization direction of the iron thin film in synchronization with scanning of one line with the charged particle beam from the charged particle column.

Charged particle beam device

A charged particle beam device which prevents an appearance of a shading contrast due to azimuth discrimination and obtains a clear magnetic domain contrast image with a high resolution and a high throughput. The charged particle beam device includes an electron beam source; a sample stage; an objective lens configured to focus electron beams on a sample; a detector that is mounted on a charged particle beam source side with respect to the objective lens and separately detects secondary electrons emitted in azimuth angle ranges of two or more different azimuths for the same observation region; an image processing and image management device including an image processing unit configured to perform synthesis after performing shading correction and contrast adjustment on an image obtained by detecting a first emission azimuth and an image obtained by detecting a second emission azimuth; an image database; and an image display unit.

A scanning electron microscope includes a spin detector configured to measure secondary electron spin polarization of secondary electrons emitted from the sample, and an analysis device configured to analyze secondary electron spin polarization data measured by the spin detector. The analysis device evaluates the strain in the sample by calculating a difference in the secondary electron spin polarization data of adjacent pixels.

Scanning electron microscope

To provide a magnetic domain image processing apparatus and a magnetic domain image processing method by which strain of an electromagnetic steel sheet can be evaluated in more detail. The invention is a magnetic domain image processing apparatus that processes a magnetic domain image, and the magnetic domain image processing apparatus includes: an image acquisition unit configured to acquire a reference magnetic domain image and a positive magnetic domain image or acquire the reference magnetic domain image and a negative magnetic domain image, the reference magnetic domain image being a magnetic domain image that is obtained when a stimulus of a reference intensity that is an intensity serving as a reference is applied to a sample, the positive magnetic domain image being a magnetic domain image that is obtained when the stimulus of an intensity higher than the reference intensity is applied to the sample, and the negative magnetic domain image being a magnetic domain image that is obtained when the stimulus of an intensity lower than the reference intensity is applied to the sample; and an image generation unit configured to generate, based on the reference magnetic domain image and the positive magnetic domain image, or based on the reference magnetic domain image and the negative magnetic domain image, a stress distribution image indicating a distribution of a stress region that is a region where stress is generated.

Magnetic domain image processing apparatus and magnetic domain image processing method

A scanning electron microscope includes a spin detector configured to measure spin polarization of a secondary electron emitted from a sample, and an analysis device configured to analyze measurement data of the spin detector. The analysis device determines a width of a region where the secondary electron spin polarization locally changes in the measurement data. The analysis device further evaluates a strain in the sample based on the width of the region. With a configuration of the scanning electron microscope, it is possible to perform analysis of a strain in a magnetic material with high accuracy.

Scanning electron microscope and method for analyzing secondary electron spin polarization

In an image acquisition system, a distortion distribution is easily measured in a wide range. A standard image of magnetic domain of a sample serving as a standard is acquired by radiation of light using a standard external magnetic field which serves as a standard, a plurality of magnetic domain images are acquired in a state where an external magnetic field is applied while being changed, a plurality of subtraction images obtained by subtracting the standard image of magnetic domain from each of the plurality of magnetic domain images are acquired, a magnetization reversal area in which a magnetic domain is reversed is extracted from each of the plurality of subtraction images, and a composite image having a plurality of magnetization reversal areas is acquired by compositing the plurality of subtraction images each having the magnetization reversal area.

Image acquisition system and image acquisition method

A spin polarimeter includes: a particle beam source or a photon beam source that is a probe for a sample; a sample chamber in which the sample is accommodated; a spin detector that includes a target to be irradiated with an electron generated from the sample by a particle beam or a photon beam from the probe, and a target chamber in which the target is accommodated, and is configured to detect a spin of the sample by detecting an electron scattered on the target; a first exhaust system that is configured to exhaust the sample chamber; a second exhaust system that is configured to exhaust the target chamber; and an orifice that is disposed between the target chamber and the sample chamber.

Spin polarimeter

Provided is an optical system which can adjust, including increase, a spin polarization degree of an electron beam. Disclosed is a charged particle device having a charged particle source which generates charged particles, a sample table on which a sample is placed, and a transport optical system which is disposed between the charged particle source and the sample table and transports the charged particles as charged particle flux toward the sample table. In this device, the transport optical system includes a magnetic field generating section which generates a magnetic field having a vertical component to a course of the charged particle flux, an electric field generating section which generates an electric field having a vertical component to the course of the charged particle flux, and a shielding section which shields at least a part of the charged particle flux passed through the magnetic field generating section and the electric field generating section. Moreover, the vertical component of the magnetic field has a magnetic field gradient, and the vertical component of the electric field gives an electrostatic force in a direction opposite to a Lorentz force received by the charged particle flux.

Charged particle device, charged particle irradiation method, and analysis device

A device including an imaging-type or a projection-type ion detection system and being capable of performing observation or inspection at high speed with an ultrahigh resolution in a sample observation device using an ion beam is provided. The device includes a gas field ion source that generates an ion beam, an irradiation optical system that irradiates a sample with the ion beam, a potential controller that controls an accelerating voltage of the ion beam and a positive potential to be applied to the sample and an ion detection unit that images or projects ions reflected from the sample as a microscope image, in which the potential controller includes a storage unit storing a first positive potential allowing the ion beam to collide with the sample and a second positive potential for reflecting the ion beam before allowing the ion beam to collide with the sample.

Mirror ion microscope and ion beam control method

The outer shape and size of a diffraction grating including an edge dislocation is made smaller than the irradiation areas of light waves and electromagnetic waves, by using an opener different from in the diffraction grating, the shape and size of the opening is superposed on the shape of a spiral wave that is generated by an edge dislocation diffraction grating, and the shape and size of the opening are reflected in the shape and size of the spiral wave on the diffractive surface. In addition, not only a diffraction grating system including a pair of a single opener and a single diffraction grating, but also a diffraction grating system in which plural openers and plural edge dislocation diffraction gratings are combined are used, and plural spiral waves can be generated on the diffractive surface with a higher degree of freedom.

Charged particle beam device, optical device, irradiation method, diffraction grating system, and diffraction grating

Although, conventionally, there were two methods, (1) a wave was transmitted through a spiral phase plate and (2) a diffraction grating containing an edge dislocation was used, they incurred complication of a configuration and securement of a larger amount of space and were not efficient because each of the spiral wave generation methods needed an incident wave to be a plane wave and at least one time of imaging is necessary at the time of wave irradiation on an observation object. In order to efficiently generate the spiral wave having a sufficient intensity, a structure of edge dislocation is taken in into a pattern of the zone plate and a spiral pattern containing a discontinuous zone is formed. Moreover, a thickness and a quality of material that change the phase of the wave by an odd multiple of &#x3c0; are selected for a material of the wave-blocking section in the pattern.

Zone plate having annular or spiral shape and Y-shaped branching edge dislocation

An electron spin detector includes plural magnetoresistive sensors and a deceleration lens of an electron beam, and each magnetoresistive sensor is inclined so that the electron beam spread by the deceleration lens can be input perpendicularly to the magnetoresistive sensor.

Electron spin detector, and spin polarized scanning electron microscope and spin-resolved x-ray photoelectron spectroscope using the electron spin detector

A charged particle spin polarimeter that is capable of resolving with high efficiency the magnetic moment of a charged particle. The charged particle spin polarimeter has a pair of convex and concave magnetic poles to apply a magnetic field with gradient to an incident charged particle and a pair of plain plate electrodes to apply, to a charged particle, an electric field for canceling a Lorentz force that the charged particle receives from the magnetic field. The magnetic moment in the magnetic field direction of a charged particle is resolved by the interaction between the gradient of the magnetic field and the magnetic moment of the charged particle.

Charged particle spin polarimeter, microscope, and photoelectron spectroscope

Chirality distribution in the molecular structure of protein or the like and magnetic domain structure are analyzed with high resolution less than 10 nm. A transmission electron microscope equipped with a spin-polarized electron source is used for holography observation. The phase of transmission spin-polarized electrons changes due to the existence of chirality structure or magnetization in a sample, which is observed as an interference pattern phase shift in holography measurement.

Growing community of inventors

Tokyo, Japan

Teruo Kohashi