The Boc Group, Inc.

Airco, Inc.

Terry A Trumbly

Peter A Sieck

Stephen C Schulz

Milan R Kirs

Robert L Cormia

Richard L Newcomb

Sigurd Andresen

Albany D Grubb

Thomas S Mosakowski

In one group of embodiments, two or more small anodes are spaced apart from one another in a magnetron, with some aspect of their electrical power being individually controlled in a manner to control a density profile across a plasma. In another group of embodiments, the same effect is obtained by mechanically moving one or more small anodes or anode masks. When used in a magnetron having either a rotating cylindrical cathode or a stationary planar cathode and designed to sputter films of material onto a substrate, the uniformity of the rate of deposition across the substrate is improved. Also, adverse effects of sputtering dielectric materials are reduced.

Use of multiple anodes in a magnetron for improving the uniformity of

A planar magnetron sputtering device with improved target utilization and cooling capacity is provided. The device includes a magnet yoke as the main structure of the cathode body. The magnet yoke is made of low carbon steel which provides magnetic shunt and physical strength. The target is attached to a metal backing plate so that the side surface of the target is substantially flush with the side surface of the backing plate. Suitable magnets are adapted for producing a closed-loop magnetic field over the lower surface of the target. The magnets include an outer magnet that has an annular structure positioned around an inner elongated magnet. The outer magnets are positioned along the perimeter of the backing plate and small magnets are employed to create larger active target area. The magnet yoke also comprises extension structures which are positioned along the side surface of the target. These extensions shunt the magnetic field at the edges of the target. The planar magnetron demonstrates improved target utilization and deposits more uniform films.

Planar magnetron sputtering apparatus

An improved method is described for coating a substrate in a system in which an insulating layer is also formed on one portion of a conductive target plate which is bombarded with ions. One such system is a reactive sputtering system in which a predetermined partial pressure of a reactive gas is established between a reactive metal target plate and the substrate. The bombarding ions are formed in a glow discharge plasma which may be magnetically confined. In accordance with the invention, an ac potential is applied to the target plate in order to prevent arcing which is believed due to the dielectric breakdown of the insulating layer.

Method for coating a substrate

Disclosed is a transparent panel capable of transmitting a desired proportion of visible radiation while reflecting a large proportion of incident solar radiation, and a method of preparing same, by sputtering an iron, nickel and chromium alloy to obtain a transparent metal film, and reactively sputtering the same or a similar alloy in the presence of oxygen. In one preferred embodiment, the metal film lies between the substrate and the metal oxide film which provides a continuous protective overlayer. In another preferred embodiment, the metal oxide film lies between the substrate and the metal film. The use of such panels can materially reduce the energy required for summer air conditioning when used for glazing in a building, vehicle or other structure.

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Pleasant Hill, CA, United States of America

Terry A Trumbly