Macronix International Co., Ltd.

Sinopower Semiconductor, Inc.

Macronix Internationalco., Ltd.

Teng-Hao Yeh

Chih-Wei Hu

Hang-Ting Lue

Yen-Hao Shih

Yu-Wei Jiang

Po-Kai Hsu

Tzu-Hsuan Hsu

Yung-Feng Lin

Wei-Chen Chen

Kuo-Pin Chang

Guan-Ru Lee

Chih-Chang Hsieh

Cheng-Yu Lee

Cheng-Lin Sung

Lee-Yin Lin

Chun-Hsiung Hung

Ken-Hui Chen

Yi-Ching Liu

Sung-Shan Tai

Ming-Liang Wei

Chia-Hui Chen

Shih-Hung Chen

Chee-Wee Liu

Su-Chueh Lo

Tzung-Ting Han

Shang-Chi Yang

Dai-Ying Lee

Chieh-Fang Chen

Yung-Chun Li

Jia-Rong Chiou

Yu-Fong Huang

Yan-Ru Chen

Min-Feng Hung

Feng-Nien Tsai

Chia-Jung Chiu

Miao-Chih Hsu

Lo-Yueh Lin

Fu-Nian Liang

Shian-Hau Liao

Li-Yen Liang

Yi Ching Liu

Chih-Yao Lin

Meng-Yen Wu

Chen-Huan Chen

Zefu Zhao

Rachit Dobhal

Chia-Jung Chiou

The present disclosure provides a 3D memory device such as a 3D AND flash memory and a method of forming a seal structure. The 3D memory device includes a chip region including a chip array and a seal region including a seal structure. The seal structure includes a ring-shaped stack structure disposed on a substrate and surrounding the chip array and a dummy channel pillar array penetrating through the ring-shaped stack structure and including a first dummy channel pillar group and a second dummy channel pillar group. The first dummy channel pillar group includes first dummy pillars that are arranged in a first direction and a second direction crossing the first direction to surround the chip array. The second dummy channel pillar group includes second dummy pillars that are arranged in the first direction and the second direction to surround the chip array. The first and the second dummy channel pillars are staggered with each other in the first and second directions.

3D memory device and method of forming seal structure

Circuit structures to improve manufacturing yield in complex 3D circuits have a first stack of conductors and a second stack of conductors having memory regions and contact regions. Conductors of the first stack have stepped arrangement in the contact region to provide landing areas on the conductors. Connecting circuits connect the landing areas of conductive layers in the first stack to through-stack conductors in vias in the second stack, to connect to circuitry below the stack. The memory regions include arrays of vertical memory pillars. The connecting circuits include interlayer connectors contacting landing areas in the first stack, extending to patterned conductors over the first and second stacks. The patterned conductors can include links from interlayer connectors of the first stack to through-stack connectors of the second stack. The circuit structure can include a plurality of structural vertical pillars in the contact region of the first stack.

3D circuit structure with stairstep contact configuration

An array of memory cells includes a resistive component disposed in thermal communication with a group of memory cells in the array of memory cells. A capacitor and a circuit to cause discharge of the capacitor via the resistive component induces thermal anneal of the group of memory cells. A charge pump and a circuit to enable the charge pump to precharge the capacitor can be used. The charge pump, the capacitor and the array of memory cells can be disposed on a single integrated circuit. The group of memory cells can be arranged in a 3D stack having multiple levels, and the resistive component can be 'snaked' through the stack. The thermal anneal can be executing in timing coordination with erase operations in flash memory.

Memory including thermal anneal circuits and methods for operating the same

A 3D memory including a plurality of tiles, a bit line transistor structure, a first upper conductive layer, and a second upper conductive layer. The bit line transistor structure is disposed between a first sub-tile and a second sub-tile in the plurality of tiles. The first upper conductive layer includes a plurality of local bit lines, a plurality of local source lines and a conductive pattern. The plurality of local bit lines include a first group and a second group of local bit lines separated from each other, wherein two adjacent local bit lines are disposed between adjacent two local source lines. The second upper conductive layer includes a global bit line. The global bit line is electrically connected to the local bit lines through the conductive pattern. The 3D memory could be a 3D AND flash memory with high capacity and high performance.

3D memory

A 3D flash memory module chip includes a memory chip and a control chip. The memory chip includes a plurality of tiles and a plurality of heaters. The tiles each include a plurality of 3D flash memory structures. The heaters are disposed around the 3D flash memory structures of each of the tiles. The control chip is bonded with the memory chip to drive at least one of the heaters.

3D flash memory module chip and method of fabricating the same

A memory device for CIM, applicable to a 3D AND-type flash memory, includes a memory array, input word line pairs, and a signal processing circuit. The memory array includes first and second pairs of memory cells. Each first pair of memory cells includes a first memory cell set coupled to a first GBL and a second memory cell set coupled to a second GBL. Each second pair of memory cells includes a third memory cell set coupled to the first GBL and a fourth memory cell set coupled to the second GBL. Each input word line pair includes a first input word line coupled to the first and the second memory cell sets, and a second input word line coupled to the third and the fourth memory cell sets s. The signal processing circuit is coupled to the first and second global bit lines.

Memory device for computing in-memory

The integrated circuit structure includes a substrate and a memory cell over the substrate. The memory cell includes a channel layer, a first doped region, a second doped region, a first ferroelectric layer, and a first gate layer. The first doped region is at a first side of the channel layer and doped with a first dopant being of a first conductivity type. The second doped region is at a second side of the channel layer opposing the first side and doped with a second dopant being of a second conductivity type different from the first conductivity type. The ferroelectric layer is over the channel layer and between the first and second doped regions. The gate layer is over the ferroelectric layer.

Integrated circuit structure and method for forming and operating the same

A memory device, such as a three-dimensional AND or NOR flash memory, includes a first chip and a second chip. The first chip has multiple source line switches, multiple bit line switches, multiple page buffers, and multiple sensing amplifiers. The first chip has multiple first pads. The second chip has multiple memory cells to form multiple memory cell blocks. Multiple second pads are on a first surface of the second chip to be respectively coupled to multiple local bit lines and multiple local source lines of the memory cell blocks. Each of the first pads is coupled to the corresponding second pads.

Memory device

A three-dimensional AND flash memory device includes a gate stack structure, a charge storage structure, a first conductive pillar and a second conductive pillar, an insulating pillar, and a channel pillar. The gate stack structure includes gate layers and insulating layers stacked alternately with each other. The first and second conductive pillars extend through the gate stack structure. The channel pillar extends through the gate stack structure. The charge storage structure is disposed between the gate stack structure and the channel pillar. The channel pillar includes: a first part and a second part connected each other. The first part is located between the charge storage structure and the insulating pillar. The second part includes a first region electrically connected to the first conductive pillar, and a second region electrically connected to the second conductive pillar. A curvature of the first part is smaller than a curvature of the second part.

3D AND flash memory device and method of fabricating the same

Methods, devices, systems, and apparatus for three-dimensional semiconductor structures are provided. In one aspect, a semiconductor device includes: a semiconductor substrate, multiple conductive layers vertically stacked on the semiconductor substrate, and multiple transistors. The multiple conductive layers include a first conductive layer, a second conductive layer, and a third conductive layer that are sequentially stacked together. The multiple transistors include a first transistor and a second transistor in the first conductive layer and a third transistor in the third conductive layer. Each transistor includes a first terminal, a second terminal, and a gate terminal. First terminals of the first, second, and third transistors are conductively coupled to a first conductive node in the second conductive layer.

Three-dimensional semiconductor structures

A three-dimensional AND flash memory device includes a gate stack structure and a silt. The silt extends along a first direction and divides the gate stack structure into a plurality of sub-blocks. Each sub-block includes a plurality of rows, and each row includes a plurality of channel pillars, a plurality of charge storage structures, and a plurality of pairs of conductive pillars. The plurality of pairs of conductive pillars are arranged in the plurality of channel pillars and penetrate the gate stack structure, and are respectively connected to the plurality of channel pillars. Each pair of conductive pillars includes a first conductive pillar and a second conductive pillar separated from each other along a second direction. There is an acute angle between the second direction and the first direction.

3D and flash memory device

A memory device includes a high density or 3D data memory and a 3D reference memory. The reference memory is used to generate a reference signal used to sense data in the data memory. Conversion circuitry converts signals from one memory cell or a group of memory cells in the reference memory into a reference signal. The reference signal is applied to a sense amplifier to sense data stored in a selected memory cell in the data memory.

High density memory with reference memory using grouped cells and corresponding operations

A memory device, such as a 3D AND flash memory, includes a memory cell block, a word line driver, and a plurality of bit line switches. The word line driver has a plurality of complementary transistor pairs for respectively generating a plurality of word line signals for a plurality of word lines. Substrates of a first transistor and a second transistor of each of the complementary transistor pairs respectively receive a first voltage and a second voltage. Each of the bit line switches includes a third transistor. A substrate of the third transistor receives a third voltage. The first voltage, the second voltage, and the third voltage are constant static voltages during a soft program operation and a soft program verify operation.

Memory device for increasing speed of soft-program operation

A three dimension memory device, such as an AND-type memory, includes a memory cell tile, multiple source line switches, multiple first bit line switches to fourth bit line switches. The memory cell tile is divided into a first and a second memory cell sub-tiles. The first bit line switches are respectively coupled to multiple first bit lines of a first part of the first memory cell sub-tile. The second bit line switches are respectively coupled to multiple second bit lines of a second part of the first memory cell sub-tile. The third bit line switches are respectively coupled to multiple third bit lines of a first part of the second memory cell sub-tile. The fourth bit line switches are respectively coupled to multiple fourth bit lines of a second part of the second memory cell sub-tile.

Three dimension memory device capable of improving sensing accuracy in high-speed data sensing operation

A memory device, such as three dimension AND Flash memory, including a plurality of word line decoding circuit areas, a plurality of common power rails and a plurality of power drivers is provided. The word line decoding circuit areas are arranged in an array, and form a plurality of isolation areas, wherein each of the isolation areas is disposed between two adjacent word line decoding circuit areas. Each of the common power rails is disposed along the isolation areas. The power drivers respectively correspond to the word line decoding circuit areas. Each of the power drivers is disposed between each of the power driving circuit areas and each of the corresponding isolation areas, wherein each of the power drivers is configured to provide a common power to the word line decoding circuit areas.

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Hsinchu, Taiwan

Teng-Hao Yeh