Hitachi-high-technologies Corporation

Takeshi Sunaoshi

Shinichi Kato

Takeshi Sato

Yasuhiko Nara

Tohru Ando

Tsutomu Saito

Kouichi Kurosawa

Masaaki Komori

Yasuhira Nagakubo

Kazutaka Nimura

Haruhiko Hatano

Takashi Mizuo

Yoshihisa Orai

The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.

Charged particle beam apparatus and control method thereof

Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample; a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector that detects secondary electrons emitted from the sample; transmitted electron detectors that detect transmitted electrons that have transmitted through the sample; and a control device that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means for cooling the sample. The vacuum system is provided with a cold trap that sucks moisture from around the sample and a vacuum gauge that measures the degree of vacuum of the vacuum system.

Charged particle beam device, electron microscope and sample observation method

A semiconductor testing method capable of quickly counting semiconductor cells in which a seemingly horizontal or vertical line is drawn with a mouse, and raster rotation is performed in alignment with the closer axis. After that, the stage is horizontally moved, pattern matching is performed on an image on a position where the image should be disposed, and an angle is adjusted. The stage is moved evenly along the X-axis and the Y-axis, achieving a movement to a destination like a straight line. In synchronization with the smooth movement of the stage, a cell is surrounded in a rectangular frame by a ruler, and the number of cells is displayed with a numeric value.

Semiconductor testing method and semiconductor tester

There are provided an inspection apparatus and method that can locally perform sample temperature regulation, so that the sample drift can be suppressed. There are included a sample stagethat holds a semiconductor sample, multiple probesused to measure electrical characteristics of a semiconductor device on the semiconductor sample, a power source that applies voltage and/or current to the probe, a detector that measures electrical characteristics of the semiconductor device on the sample with which the probe is brought into contact, and an electromagnetic wave irradiating mechanism that irradiates electromagnetic wave on a measurement section of the semiconductor sample

Inspection apparatus having a heating mechanism for performing sample temperature regulation

Inspection apparatus and method

Growing community of inventors

Hitachinaka, Japan

Takeshi Sunaoshi