Mitsubishi Denki Kabushiki Kaisha

Ryoden Semiconductor System Engineering Corporation

Ryoden Semiconductor System Emgineering Corporation

Kabushiki Kaisha Kobe Seiko Sho

Takeshi Kuroda

Cozy Ban

Naoki Yokoi

Toko Konishi

Akinori Matsumoto

Itaru Kanno

Kenichi Nishiguchi

Akira Ichikawa

Akito Takeya

Tomotada Maruo

Mikako Takeda

Hidenori Sakai

When an IPA is fed to a nozzle, a flow of the IPA passing through holes is generated. The flow becomes film-shaped and goes downward along an inner surface of a side wall of a processing vessel. Then, the flow is collected by a liquid receiving section formed in a lower portion of the processing vessel and discharged to an outside. The inner surface of the side wall of the processing vessel is covered with the flow of the IPA. Therefore, an IPA vapor can be prevented from condensing uselessly on the inner surface. As a result, the IPA vapor is effectively utilized for condensation on a surface of the object to be processed which is mounted on a pan. Thus, the defective dryness of the object can be prevented.

Drying apparatus and method using IPA of a semiconductor wafer

A nozzle and an exhaust member are provided opposite to each other with an upward opening of a processing vessel interposed therebetween. A side wall of the processing vessel is smoothly curved inward as the opening is approached upward. The nozzle spouts a nitrogen gas fed from a nitrogen gas feeder as a jet for covering the opening toward an exhaust port of the exhaust member. The jet can effectively function as a curtain because the side wall of the processing vessel is curved. Therefore, a cooling coil necessary for a conventional apparatus is not required. Consequently, instability of the state of the IPA vapor caused by the cooling coil can be eliminated so that defective dryness is relieved or eliminated.

Drying apparatus and method

A drying apparatus for processing a surface of a substrate wherein, when a nitrogen gas is fed to a nozzle, a jet of the nitrogen gas spouted through a jet hole is generated. The jet becomes film-shaped and is projected upwardly along an inner surface of a side wall of a processing vessel. Then, the jet is collected into an outside through a suction port formed in an upper portion of the processing vessel. The inner surface of the side wall of the processing vessel is covered with the jet. Therefore, an IPA vapor can be prevented from condensing uselessly on the inner surface. As a result, the IPA vapor is effectively utilized for condensation on a surface of the object to be processed which is mounted on a pan. Thus, defective dryness of the object can be prevented.

Drying apparatus for processing surface of substrate

In a reflection type angle of view transforming optical apparatus for transforming an angle of view in an image apparatus and so forth, sufficient strength can be provided and process is facilitated by using reflecting mirrors in a wide angle optical system. The reflection type angle of view transforming optical apparatus includes a primary mirror 8 having a reflecting surface provided in an axisymmetric form to reflect incident light 12 as primary reflected light 13, a secondary mirror 10 having a reflecting surface provided in an axisymmetric form about the same axis of rotational symmetry 9 as that of the primary mirror 8, opposed to the primary mirror 8 so as to reflect the primary reflected light 13 and to get secondary reflected light 14 for focusing on a view point, and a transparent case 11 to support the primary mirror 8 and the secondary mirror 10, and transmit the incident light 12.

Reflection type angle of view transforming optical apparatus

Obtained are a washing apparatus inhibiting a washing liquid from losing its washability and a method therefor. A circulating pump (5) circulates a washing liquid (3) successively through a heater (6), a filter (7), and an overflow washing tank (2). The washing liquid (3) is gradually evaporated. On the other hand, a water supplier (10) supplies the overflow washing tank (2) with water through a tube (8). An amine supplier (11) supplies the overflow washing tank (2) with amines through a tube (9). A control unit (12) controls the quantities of the water and amines as supplied. In a washing part (50), therefore, the quantities of the water and amines are inhibited from being reduced upon a lapse of time from operation starting, whereby the washing liquid (3) is inhibited from losing its washability.

Washing apparatus and method therefor

Growing community of inventors

Hyogo, Japan

Takeshi Kuroda