Hitachi, Ltd.

Hitachi-High-Technologies Corporation

Hitachi High-Tech Corporation

Hitachi Kenki Fine Tech Co., Ltd.

Hitachi High-Tech Fine Systems Corporation

Takenori Hirose

Kaifeng Zhang

Masahiro Watanabe

Mineo Nomoto

Hideaki Sasazawa

Keiya Saito

Teruaki Tokutomi

Tsuneo Nakagomi

Toshihiko Nakata

Minoru Yoshida

Hiroyuki Kojima

Shigeru Serikawa

Shunji Maeda

Minori Noguchi

Takanori Ninomiya

Yasuhiro Yoshitake

Hidemi Sato

Hirofumi Tsuchiyama

Yukio Kenbo

Takehiro Tachizaki

Shinji Homma

Hiroki Kawada

Yukio Kembo

Tetsuya Matsui

Katsuhiro Sasada

Susumu Aiuchi

Takafumi Morimoto

Shuichi Baba

Yoshiyuki Nagano

Shinji Honma

Shou Takami

Tomonori Saeki

Takehiro Tatizaki

Toshinori Sugiyama

Akira Tobita

Provided is a spectroscopic measurement device capable of improving detection sensitivity to a change in a physical property value such as expansion of a sample to which energy is applied by an infrared ray or the like. The spectroscopic measurement device includes: a stage on which a sample is to be placed; an energy source configured to generate an energy beam to be emitted to a predetermined region of the sample; an electromagnetic wave source configured to generate an electromagnetic wave to be emitted to the sample; an objective lens configured to focus the electromagnetic wave in the predetermined region; two confocal detectors configured to detect the electromagnetic wave reflected by the sample; and a calculation unit configured to calculate, based on each of outputs of the confocal detectors, a change in a physical property value of the sample when the energy beam is emitted to the predetermined region.

Spectroscopic measurement device

Provided is a spectrometry apparatus that suppresses a reduction in usage efficiency of an irradiation energy of a light. A spectrometry apparatus of the disclosure includes a stage on which a sample is placed, an electromagnetic source that emits an electromagnetic wave, one or a plurality of optical elements that transform a spatial energy distribution of the electromagnetic wave and emit the electromagnetic wave, and a reflective objective lens that collects the electromagnetic wave after a transformation of the spatial energy distribution and irradiates the sample with the collected electromagnetic wave.

Spectrometry apparatus

To enhance the measurement sensitivity of a scanning probe microscope. In a cross sectional view, a cantilever includes a vertex portion that is a portion close to a sample and is covered by a metallic film, a ridge that is connected to the vertex portion and is covered by the metallic film, and an upper corner portion that is connected to the ridge. Here, the upper corner portion and a part of the ridge are portions to be irradiated with excitation light emitted from a light source of the scanning probe microscope.

Cantilever, scanning probe microscope, and measurement method using scanning probe microscope

A pattern height measurement device capable of high-precision measurement of the dimensions of a fine pattern, and a charged particle beam device are provided. The pattern height measurement device includes a calculation device that determines dimensions of a sample, in the height direction, based on first reflected light information obtained by dispersing light reflected from a sample. The calculation device determines second reflected light information based on a formula for the relationship between the value for the dimension in the sample surface direction of a pattern formed upon the sample, obtained by irradiation of a charged particle beam on the sample, the value for the dimension in the height direction of the sample, and reflected light information; compares a second reflected light intensity and the first reflected light information; and outputs the value for the dimension in the height direction of the sample in the second reflected light information.

Pattern height measurement device and charged particle beam device

To detect near-field light, which is generated by a thermal assist type magnetic head element, and leaking light with high sensitivity and to more accurately obtain the spatial intensity distribution of a near-field light generation area, an inspection apparatus for a thermal assist type magnetic head element is adapted so that a distance between a cantilever and the surface of a specimen and the excitation amplitude of the cantilever are set to be small to detect near-field light with high sensitivity by the suppression of an influence of other light components, a distance between the cantilever and the surface of the specimen and the excitation amplitude of the cantilever are set to be large to detect other light components present in the vicinity of near-field light with high sensitivity by the suppression of an influence of the amount of detected near-field light when other light components are measured.

Inspection method and its apparatus for thermal assist type magnetic head element

In a method and an apparatus for inspecting a thermally assisted magnetic recording head element, a specimen is mounted on a table movable in a plane of a scanning probe microscope device, evanescent light is generated from a portion of light emission of evanescent light of the specimen, scattered light of the evanescent light is detected by moving the table in the plane while a cantilever of the scanning probe microscope having a probe is vertically vibrated in the vicinity of a surface of the specimen, and an intensity distribution of the evanescent light emitted from the portion of light emission of evanescent light or a surface profile of the portion of light emission of evanescent light of the specimen is inspected using position information of generation of the evanescent light based on the detected scattered light.

Thermally assisted magnetic recording head inspection method and apparatus

To detect both of near-field light and magnetic field generated by a thermal assist type magnetic head and to perform inspection of the head, a cantilever of a scanning probe microscope has a lever in which a probe is formed, a thin magnetic film formed on a surface of the probe, and fine particles or thin film of noble metal or an alloy including noble metal formed on a surface of the magnetic film. An inspection apparatus has the cantilever, a displacement detection unit to detect vibration of the cantilever, a near-field light detection unit to detect scattered light caused by near-field light generated from a near-field light emitter and enhanced on the surface of the probe of the cantilever, and a processing unit to process signals obtained by detection with the displacement detection unit and the near-field light detection unit.

Cantilever of scanning probe microscope and method for manufacturing the same, method for inspecting thermal assist type magnetic head device and its apparatus

In the inspection of a defect in a fine concave-convex pattern, a spectral waveform of a detection area of an inspection object is detected, area determination as to which area section determined by a pattern type of the inspection object the detection area belongs to is performed, a feature calculation equation and a determination index value which correspond to a determined area section and vary according to defect type is selected, feature calculation on the spectral waveform data in accordance with the selected feature calculation equation is performed, and a calculated feature value and the selected determination index value are compared to perform determination processing according to defect type.

Method for defect determination in fine concave-convex pattern and method for defect determination on patterned medium

In a method of manufacturing this cantilever for the magnetic force microscope, a magnetic film is formed on a probe at a tip of the cantilever for the magnetic force microscope. When a non-magnetic rigid protective film is formed around the probe, the film is formed from the front of the probe of the cantilever for the magnetic force microscope at an angle (15&#xb0; to 45&#xb0;) and from the back of the probe of the cantilever for the magnetic force microscope in two directions each at an angle in a range of (15&#xb0; to 30&#xb0;).

Cantilever for magnetic force microscope and method of manufacturing the same

An inspection region is specified using the design information to perform region division for measurement through a scatterometry method. The obtained detection data is classified by pattern into a periodic region and a non-periodic region. A spectroscopic characteristic is detected by an optical sensor to extract features. The extracted features are compared with features stored in a feature map database for each region to evaluate a state of a patterned medium.

Scatterometry method and device for inspecting patterned medium

In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.

Spectral detection method and device, and defect inspection method and apparatus using the same

This invention relates to a pattern shape inspection method and an apparatus thereof for conducting a first step of irradiating wideband illuminating light which contains far ultraviolet light to a sample from a perpendicular direction, inspecting a shape of the pattern based on a spectral waveform of reflecting light detected from the sample, and detecting an edge roughness of the pattern based on the spectral waveform of the reflecting light detected from the sample, and a second step of irradiating a laser beam to the sample from an oblique direction, and detecting the edge roughness of the pattern based on scattered light detected from the sample.

Pattern shape inspection method and apparatus thereof

If an inspection method for inspecting a patterned medium is intended for the nanoimprint process control, it is necessary to measure a correct shape of each pattern element. On the other hand, if the inspection method is intended for the quality control of products, it is necessary to inspect the products on a I00 percent basis. However, the conventional method which uses SEM or AFM could not satisfy these requirements. According to the present invention, IO0-percent inspection of products becomes possible by a method including the steps of: irradiating a surface of a hard disk medium, on which a magnetic material pattern is formed, with a light beam including a plurality of wavelengths; detecting the intensity of a reflected light beam from the hard disk medium on a wavelength basis; calculating a spectral reflectance from the detected intensity of the reflected light beam; and detecting a shape of each pattern element formed on the hard disk medium on the basis of the calculated spectral reflectance.

Method and apparatus for inspecting defects of patterns formed on a hard disk medium

An apparatus for inspecting a pattern shape of a magnetic record medium or its stamper includes: a moving mechanism, on which an object to be inspected where a pattern is formed is placed and which moves the object to be inspected in a radial direction while rotating the object; an irradiating optical system that applies illuminating light of a wide band including far ultraviolet light to the object to be inspected moved in the radial direction while rotating the object by the moving mechanism in a polarized state suitable for the object to be inspected from an oblique direction; a detecting optical system that detects zero-order reflected light generated from the object to be inspected irradiated by the irradiating optical system; and a shape inspection unit that inspects a pattern shape formed on the object to be inspected based on a spectral reflectance waveform obtained by dispersing the detected zero-order reflected light, thereby inspecting the pattern shape at a high speed and with high sensitivity.

Growing community of inventors

Tokyo, Japan

Takenori Hirose