Tokyo Electron Limited

Takayuki Fukudome

Kenichi Shigetomi

Takeshi Saikusa

Kousuke Yoshihara

Suguru Enokida

Kazuhiro Takeshita

Eiichi Sekimoto

Kazuto Umeki

A substrate processing apparatus includes plural heating modules each including a table on which a substrate is placed to be heated, the substrate having plural heated zones. The table has plural heaters each assigned to heat respective ones of the heated zones. Heat generation of the heaters is controlled independently. A control unit controls the heaters such that integrated quantities of heat of the respective heated zones given by the corresponding heaters from first to second time point are substantially identical to each other in each of the heating modules, and are substantially identical to each other among the heating modules. The first time point is set when a temperature transition profile of the substrate is rising toward a process temperature after placing the substrate on the table under a condition where heat generation of the heaters is stable. The second time point is set after the temperature transition profile reaches the process temperature.

Substrate processing apparatus and method of adjusting substrate processing apparatus

Time periods required for a wafer W to reach a reference temperature are made to be uniform between heating modulesand between heating target regions in a temperature rising time period after the wafer W is placed on a heating plate, and temperature rise curves of temperature transition profiles in a temperature rise transition time period are made to be same. Therefore, the temperature transition profiles of the heating target regions are all same, and total heat amounts in the temperature rise transition time period are uniform within a surface of the wafer W and between the heating modules, so that a line width of a pattern formed on the wafer W becomes uniform. Thus, it is possible to perform a heating treatment with high uniformity within the surface of the wafer W and between the wafers W processed in the different heating modules

Heating apparatus and substrate processing apparatus

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Koshi, Japan

Takayuki Fukudome