Shinko Electric Industries Co., Ltd.

Takaharu Yamano

Tadashi Arai

Toshio Kobayashi

Tetsuya Koyama

Tsuyoshi Kobayashi

Hajime Iizuka

Hideaki Sakaguchi

Yoshihiro Machida

Yuji Kunimoto

Koichi Tanaka

Kiyoaki Iida

Takashi Yanagisawa

Tomoaki Mashima

Masahiro Sunohara

Yukiharu Takeuchi

Nobuyuki Kurashima

Yoichi Harayama

Syota Miki

Hidenori Takayanagi

Toshio Gomyo

Kei Murayama

Takashi Kurihara

Hiroyuki Kato

Yoshihiro Ihara

Sumihiro Ichikawa

Kosaku Harayama

Takako Yoshihara

A semiconductor device includes a wiring substrate and multiple semiconductor chips mounted on the wiring substrate by flip chip bonding with a resin being interposed between the wiring substrate and the semiconductor chips. The wiring substrate includes a chip mounting region in which the semiconductor chips are arranged in a matrix, and a resin injection region protruding from an end of the chip mounting region. The outer edge of the wiring substrate in the chip mounting region is positioned inward of the outer edge of the semiconductor chips arranged in the matrix. The outer edge of the wiring substrate in the resin injection region protrudes outward of the outer edge of the semiconductor chips arranged in the matrix.

Semiconductor device and semiconductor device array

An electronic part embedded substrate is disclosed. The electronic part embedded substrate includes a first substrate, a second substrate, an electronic part, an electrically connecting member, and a sealing member. A method of producing an electronic part embedded substrate is also disclosed. The method includes mounting an electronic part onto a first substrate, laminating a second substrate on the first substrate through an electrically connecting member; and filling a space between the first substrate and the second substrate with a sealing member to seal the electronic part.

Electronic part embedded substrate and method of producing an electronic part embedded substrate

A semiconductor device includes a semiconductor substrate, which includes a through hole that extends through the semiconductor substrate. An insulative layer includes a first surface, an opposite second surface covering the semiconductor substrate, and an opening aligned with the through hole. An insulative film covers an inner wall surface of the semiconductor substrate and the opening. A through electrode is formed in the through hole and the opening inward from the insulative film. The through electrode includes a first end surface that forms a pad exposed from the first surface of the insulative layer. The first end surface of the through electrode is flush with the first surface of the insulative layer.

Semiconductor device, semiconductor package, method for manufacturing semiconductor device, and method for manufacturing semiconductor package

Chip embedded substrate and method of producing the same

A semiconductor device includes a semiconductor substrate. A through hole extends through the semiconductor substrate. A first insulating layer covers an upper surface of the semiconductor substrate and includes an opening in communication with the through hole. An insulating film covers wall surfaces of the through hole and the opening. A through electrode is formed in the through hole and the opening. A first connection terminal includes an electroless plating metal layer formed on an end surface of the through electrode and an end surface of the insulating film. The first connection terminal has a larger diameter than the through electrode. A wiring pattern is laminated on a lower surface of the semiconductor substrate. An electrode pad is connected to the wiring pattern. The through electrode is connected to the wiring pattern.

Semiconductor device and method for manufacturing semiconductor device

A method of producing a chip embedded substrate is disclosed. This method comprises a first step of mounting a semiconductor chip on a first substrate on which a first wiring is formed; and a second step of joining the first substrate with a second substrate on which a second wiring is formed. In the second step, the semiconductor chip is encapsulated between the first substrate and the second substrate and electrical connection is made between the first wiring and the second wiring so as to form multilayered wirings connected to the semiconductor chip.

Semiconductor chips are placed in recesses of a support carrier with electrode surfaces facing upward in a state where the semiconductor chips are arranged separately from each other. A seal resin part is formed by encapsulating the semiconductor chips by an insulating resin on said support carrier. Rewiring patterns are formed on a top surface of the seal resin part. External connection terminals are formed on the rewiring patterns. Bottom parts of the recesses of the support carrier are removed from the seal resin part while maintaining reinforcing members of the support carrier to be remained. The semiconductor packages are individualized by cutting the seal resin part along an outside of each reinforcing member.

Semiconductor package having a silicon reinforcing member embedded in resin

A semiconductor device includes a reinforcement plate having an accommodating hole and a through hole extending from a first surface to a second surface, a semiconductor chip including a chip core and a pad formed on a pad surface of the chip core, the semiconductor chip disposed in the accommodating hole with the pad surface flush with the first surface, the chip core having substantially the same thickness as the reinforcement plate and including a semiconductor substrate, a through-hole electrode disposed in the through hole, resin sealing the semiconductor chip and the reinforcement plate, a interconnection pattern disposed on the first-surface side of the reinforcement plate to connect between the through-hole electrode and the pad, and a interconnection pattern disposed on the second-surface side of the reinforcement plate to be connected to the through-hole electrode, wherein the reinforcement plate is made of the same material as the semiconductor substrate.

Semiconductor device with reinforcement plate and method of forming same

A semiconductor device includes a semiconductor substrate including a bump electrode, a first insulating layer formed on the semiconductor substrate and arranged to a lateral direction of the bump electrode, a first wiring layer formed on the first insulating layer and connected to the bump electrode, a second insulating layer formed on the first wiring layer, a via hole formed in the second insulating layer, and reaching the first wiring layer, a second wiring layer formed on the second insulating layer and connected to the first wiring layer via a via conductor formed in the via hole, and an external connection terminal connected to the second wiring layer, wherein an elastic modulus of the second insulating layer is set lower than an elastic modulus of the first insulating layer.

Semiconductor device having a multilayer structure

A method of manufacturing an electronic parts packaging structure including the steps of preparing a plurality of sheet-like units each of which is constructed by a first insulating layer, a wiring formed on one surface of the first insulating layer, electronic parts connected to the wiring, a second insulating layer formed on an one surface side of the first insulating layer to cover the electronic parts, and a connecting portion for connecting electrically the wiring, and stacking mutually the units to arrange directions of unit adjacent in a thickness direction alternately oppositely, and bonding the units such that electronic parts of respective units are electrically connected mutually via connecting portions.

Method of manufacturing an electronic parts packaging structure

A manufacturing method of a substrate with through electrodes, comprising a substrate having through holes, and through electrodes received in the through holes, includes a through electrode formation step of forming the through electrodes on a support plate, a substrate formation step of forming the substrate, a through electrode reception step of stacking the substrate on the support plateand receiving the through electrodes in the through holes, a resin filling step of filling gaps between side surfaces of the through electrodes and inner walls of the through holes of the substratewith a resin, and a support plate removal step of removing the support plate after the resin filling step.

Manufacturing method of substrate with through electrode

A disclosed semiconductor device includes a semiconductor chip having an electrode pad on a circuit forming face of the semiconductor chip, an internal connection terminal formed on the electrode pad, a stepped portion formed along an outer edge portion of the circuit forming face of the semiconductor chip, a first insulating layer formed on the circuit forming face of the semiconductor chip to cover at least the stepped portion, a second insulating layer formed on the circuit forming face of the semiconductor chip to cover the first insulating layer, and an interconnection formed on the second insulating layer and electrically connected to the electrode pad via the internal connection terminal.

Semiconductor device and method of manufacturing the same

In a stacked layer type semiconductor package constructed by stacking a plurality of packages with each other, the plurality of packages include a semiconductor package including: a semiconductor chip; a substrate in which a concave portion has been formed, the semiconductor chip being mounted in the concave portion; and a wiring line structure constructed in such a manner that the wiring line structure can be externally connected to the semiconductor chip at least just above and just under the semiconductor chip.

Semiconductor package and stacked layer type semiconductor package

In a method of manufacturing a semiconductor-device mounted board, connection terminals are formed on electrode pads on a semiconductor integrated circuit respectively. A first insulating layer is formed to cover the connection terminals. A plate-like medium having a rough surface is disposed on the first insulating layer. The rough surface of the plate-like medium is pressed onto the first insulating layer so that a part of each of the connection terminals is exposed. A semiconductor device is produced by removing the plate-like medium. A second insulating layer is formed to cover side surfaces of the semiconductor device. A wiring pattern is formed to cover surfaces of the first and second insulating layers, the wiring pattern being electrically connected to the exposed connection terminal parts.

Growing community of inventors

Nagano, Japan

Takaharu Yamano