Taiwan Semiconductor Manufacturing Comp. Ltd.

Tai-Hsiang Lin

You-Cheng Yeh

Jih-Churng Twu

Yu-Chi Tsai

Hom-Chung Lin

Chin-Yun Chen

Chen-Hung Lin

Chung-Yi Yen

Yen-Ching Huang

Mei-Tsu Lai

Yu Hsuan Chuang

Mao-Chih Huang

Jian-Shian Lin

Chien-Chou Ke

A container includes a container body and an air processing system. The container body includes a plurality of walls defining an interior space for receiving wafers. The air processing system is attached to the container body. The air processing system includes an exchange module, an air extraction module, a first contaminant removal module, a processing module, a second contaminant removal module, a controller module and a power module. The exchange module is coupled to one of the walls of the container body. The air extraction module extracts air from the container body. The first contaminant removal module is coupled to the air extraction module and the exchange module. The processing module is coupled to the air extraction module. The second contaminant removal module is coupled to the processing module and the exchange module. The controller module is configured to turn the air extraction module on and off.

Air processing system for semiconductor container

A method for fault detection in a fabrication tool is provided. The method includes processing a semiconductor wafer in a fabrication tool according to a plurality of process events of a process run. The method further includes measuring humidity in the fabrication tool in at least one of the process events. The method also includes comparing the humidity measured in one of the process events with an expected humidity associated with the process event. In addition, the method includes based on the comparison, indicating an alarm condition when a difference between the measured humidity and the expected humidity exceeds a range of acceptable values associated with the process event.

Fault detection method in semiconductor fabrication facility

A photomask purging method includes opening a pod having a photomask therein, gripping the photomask by an end effector, moving the end effector from the opened pod to a destination where a gas exit is toward, exhausting a gas from the gas exit toward the gripped photomask, and rotating the end effector with respect to a horizontal plane when the end effector is at the destination where the gas exit is toward.

Photomask purging system and method

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Taichung, Taiwan

Tai-Hsiang Lin