Ulvac, Inc.

Tadashi Oka

Kyuzo Nakamura

Takahiro Yajima

Yuko Kato

Shouta Kanai

Yousuke Matsumoto

Yasuaki Murata

Tadayuki Satou

To provide a device structure that is capable of preventing oxygen, water, and the like from entering the device, and a method of producing the same. A device structureaccording to an embodiment of the present invention includes a substrate (base), a device layer, a first inorganic material layer (convex portion), and a first resin material. The substratehas a first surfaceand a second surfaceopposite to the first surface. The device layeris arranged on at least the first surfaceout of the first and second surfacesand. The first inorganic material layeris formed on the first surface. The first resin materialis unevenly arranged around the first inorganic material layer

Device structure and method of producing the same

An electrostatic chuck is provided which is arranged that, at the time of performing processing treatments of irradiating light to a to-be-processed substrate while holding the translucent to-be-processed substrate, the to-be-processed substrate can surely be held even in case the attraction force lowers due to photoelectric effect. An electrostatic chuck has a chuck plate made of a dielectric material, and a first electrode and a second electrode, both electrodes being disposed in the chuck plate. A voltage is applied between the first and the second electrodes to thereby attract the to-be-processed substrate S to the surface of the chuck plate. The electrostatic chuck has, on part of the surface of the chuck plate, a substrate holding sectionwhich is made of an adhesive sheet and the like having an adhesive force with respect to the to-be-processed substrate.

Electrostatic chuck and vacuum processing apparatus

Growing community of inventors

Kanagawa, Japan

Tadashi Oka