Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Stmicroelectronics (crolles 2) Sas

Stmicroelectronics (rousset) Sas

Sylvain Barraud

Maud Vinet

Louis Hutin

Shay Reboh

Yves Morand

Emmanuel Augendre

Bernard Previtali

François Andrieu

Jean-Pierre Colinge

Joris Lacord

Nicolas Posseme

Laurent Grenouillet

Claire Fenouillet-Beranger

Benoit Bertrand

Remi Coquand

Cyrille Le Royer

Aomar Halimaoui

Sylvain Maitrejean

Jean-Charles Barbe

Yann-Michel Niquet

Claire Gallon

Joël Kanyandekwe

Pascal Scheiblin

Ivan Duchemin

Pierrette Rivallin

Théophile Dubreuil

Paul Amari

Rémi Coquand

A method for manufacturing a pFET transistor, the method for manufacturing the transistor including providing a base structure comprising a silicon channel and a gate structure, the gate structure surrounding the channel leaving two flanks of the channel free; growing a first layer made from silicon-germanium alloy on the flanks of the channel; enriching the channel with germanium atoms from the first layer; and forming a drain region and a source region on either side of the channel.

Method for manufacturing a transistor with a gate-all-around structure

A microelectronic device includes a field-effect n-MOS transistor, a first N-doped zone, constituting one from among the drain and the source of the n-MOS transistor and a second N-doped zone, constituting the other from among the drain and the source of the n-MOS transistor. The device further includes a field-effect p-MOS transistor, a first P-doped zone, constituting one from among the drain and the source of the p-MOS transistor, a dielectric layer in contact with the doped zones and a rear gate. The n-MOS transistor and the p-MOS transistor are separated by a PN junction.

Microelectronic device with two field-effect transistors

An in-memory computing circuit includes a plurality of memory planes. Each plane forming a two-dimensional matrix of non-volatile, resistive and programmable memory cells. Each memory cell having a selection node, a first input/output node and a second input/output node. The computing circuit comprising at least one elementary group of memory cells comprising: a first memory cell belonging to any one of the memory planes and intended to store a first input datum; a second memory cell belonging to any one of the memory planes and intended to store a second input datum; a third memory cell belonging to a memory plane different from that of the first and of the second memory cell. The third memory cell being intended to store the result of a first logic operation with the first and second input data as operands.

Three-dimensional structure of memories for in-memory computing

A device with stacked transistors includes a first transistor of a first type, in particular N or P, the first transistor having a channel formed in one or more first semi-conducting rods of a semi-conducting structure including semi-conducting rods disposed above each other and aligned with each other, and a second transistor of a second type, in particular P or N, with a gate-surrounding gate and a channel region formed in one or more second semi-conducting rods of said semi-conducting structure and disposed above the first semi-conducting rods. The source block of the second transistor is distinct from the source and drain block of the second transistor, and the drain block of the second transistor is distinct from the drain and source blocks of the second transistor.

Architecture with stacked N and P transistors with a channel structure formed of nanowires

A device includes gate-all-around transistors and method for manufacturing such a device. A method for manufacturing a microelectronic device includes at least two transistors each comprising a channel in the shape of a wire extending in a first direction x, a gate surrounding said channel, a source and a drain, said transistors being stacked in a third direction z and each occupying a level nz (z=1 . . . 4) of given altitude in the third direction z.

Device comprising wrap-gate transistors and method of manufacturing such a device

The invention provides a microelectronic device comprising at least two memory cells each comprising a so-called selection transistor and a memory element associated with said selection transistor, each transistor comprising a channel in the form of a wire extending in a first direction (x), a gate bordering said channel, a source extending in a second direction (y), and a drain connected to the memory element, said transistors being stacked in a third direction (z) and each occupying a given altitude level in the third direction (z), the microelectronic device wherein the source and the drain are entirely covered by spacers projecting in the third direction (z) in a plane (xy). The invention also provides a method for manufacturing such a device.

3D memory and manufacturing process

A process for fabricating an electronic component incorporating double quantum dots and split gates includes providing a substrate surmounted with a stack of a semiconductor layer and of a dielectric layer that is formed above the semiconductor layer. The process also includes forming a mask on the dielectric layer and etching the dielectric layer and the semiconductor layer with the pattern of the mask, so as to form a stack of a semiconductor nanowire and of a dielectric hard mask. Finally, the process includes depositing a gate material on all of the wafer and carrying out a planarization, until the dielectric hard mask is reached, so as to form first and second gates that are electrically insulated from each other on either side of said nanowire.

Method for producing an electronic component with double quantum dots

A method for producing an FET transistor includes producing a transistor channel, comprising at least one semiconductor nanowire arranged on a substrate and comprising first and second opposite side faces; producing at least two dummy gates, each arranged against one of the first and second side faces of the channel; etching a first of the two dummy gates, forming a first gate location against the first side face of the channel; producing a first gate in the first gate location and against the first side face of the channel; etching a second of the two dummy gates, forming a second gate location against the second side face of the channel; and producing a second gate in the second gate location and against the second side face of the channel.

Method of fabricating a field effect transistor

Implementation of a device with stacked transistors comprising:

Architecture of N and P transistors superposed with canal structure formed of nanowires

A method of fabricating an electronic component with multiple quantum islands is provided, including supplying a substrate on which rests a nanowire made of semiconductor material not intentionally doped, the nanowire having at least two main control gates resting thereon so as to form respective qubits in the nanowire under the two main control gates, the two main control gates being separated by a groove, top and lateral faces of the two main control gates and a bottom of the groove being covered by a dielectric layer; depositing a conductive material in the groove and on the top of the two main control gates; and planarizing down to the dielectric layer on the top of the two main control gates, so as to obtain an element made of conductive material self-aligned between the main control gates.

Method of manufacturing an electronic component including multiple quantum dots

An electronic component with multiple quantum islands is provided, including a substrate on which rests a nanowire made of semiconductor material not intentionally doped; two main control gates resting on the nanowire so as to form respective qubits in the nanowire, the two main control gates being separated by a groove, and bottom and lateral faces of the groove are covered by a dielectric layer; an element made of conductive material formed on the dielectric layer in the groove; a carrier reservoir that is offset with respect to the nanowire, the element made of the conductive material being separated from the carrier reservoir by another dielectric layer such that the element made of the conductive material is coupled to the carrier reservoir by field effect. A method of fabricating an electronic component with multiple quantum islands is also provided.

Electronic component with multiple quantum islands

A method of making a quantum device with a quantum island structure is provided. The method includes the formation of a stack including a first semiconducting layer based on an undoped semiconducting material on which at least one second doped semiconducting layer is grown by epitaxy, the doping being made during epitaxial growth, a first region belonging to the first semiconducting layer and a second region belonging to the second semiconducting layer being suitable for forming a quantum island.

Quantum box device comprising dopants located in a thin semiconductor layer

Method for making a semiconductor device, comprising:

Method for making a semiconductor device with nanowire and aligned external and internal spacers

Single-electron transistor comprising at least:

Single-electron transistor and its fabrication method

A method for making a transistor in which:

Growing community of inventors

Le Grand Lemps, France

Sylvain Barraud