Growing community of inventors

Santa Clara, CA, United States of America

Susrut Kesari

Average Co-Inventor Count = 4.44

ph-index = 4

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 59

Susrut KesariWilliam M Lamanna (3 patents)Susrut KesariMichael J Parent (3 patents)Susrut KesariLawrence A Zazzera (3 patents)Susrut KesariRichard M Minday (2 patents)Susrut KesariRichard M Flynn (1 patent)Susrut KesariMichael G Costello (1 patent)Susrut KesariJohn G Owens (1 patent)Susrut KesariHaiyan Zhang (1 patent)Susrut KesariDaniel R Vitcak (1 patent)Susrut KesariJason M Kehren (1 patent)Susrut KesariSteven D Boyd (1 patent)Susrut KesariFred E Behr (1 patent)Susrut KesariLarry A Zazzera (1 patent)Susrut KesariSusrut Kesari (5 patents)William M LamannaWilliam M Lamanna (95 patents)Michael J ParentMichael J Parent (21 patents)Lawrence A ZazzeraLawrence A Zazzera (8 patents)Richard M MindayRichard M Minday (11 patents)Richard M FlynnRichard M Flynn (123 patents)Michael G CostelloMichael G Costello (59 patents)John G OwensJohn G Owens (58 patents)Haiyan ZhangHaiyan Zhang (28 patents)Daniel R VitcakDaniel R Vitcak (28 patents)Jason M KehrenJason M Kehren (12 patents)Steven D BoydSteven D Boyd (3 patents)Fred E BehrFred E Behr (3 patents)Larry A ZazzeraLarry A Zazzera (1 patent)
..
Inventor’s number of patents
..
Strength of working relationships

Company Filing History:

1. 3m Innovative Properties Company (5 from 14,067 patents)


5 patents:

1. 7147767 - Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor

2. 6884338 - Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor

3. 6858124 - Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor

4. 6540930 - Use of perfluoroketones as vapor reactor cleaning, etching, and doping gases

5. 6394107 - Use of fluorinated ketones as wet cleaning agents for vapor reactors and vapor reactor components

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as of
12/11/2025
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