International Business Machines Corporation

Globalfoundries Inc.

Sungjae Lee

Anthony I Chou

Arvind Kumar

Scott Keith Springer

Richard Andre Wachnik

Lan Luo

Jonghae Kim

Siyuranga O Koswatta

Edward J Nowak

Choonghyun Lee

Soon-Cheon Seo

Injo Ok

Robert Russell Robison

Jean-Olivier Plouchart

James Johnson

James Douglas Warnock

Arun Joseph

Leon Jacob Sigal

Jean-Oliver Plouchart

Joseph M Lukaitis

Jin Zheng Wallner

Nagashyamala R Dhanwada

Michael R Scheuermann

Arjen Alexander Mets

William W Dungan

Yanqing Deng

Richard A Wachnick

A method of forming a silicon-germanium heterojunction bipolar transistor (hbt) device is provided. The method includes forming a stack of four doped semiconductor layers on a semiconductor substrate. The method further includes forming a dummy emitter contact and contact spacers on a fourth doped semiconductor layer of the stack of four doped semiconductor layers, and removing portions of the second, third, and fourth semiconductor layers to form a vertical fin. The method further includes recessing the second and fourth doped semiconductor layers, and depositing a condensation layer on the second, third, and fourth doped semiconductor layers. The method further includes reacting the condensation layer with the third doped semiconductor layer to form a protective segment on a condensed protruding portion.

Vertical fin type bipolar junction transistor (BJT) device with a self-aligned base contact

A semiconductor structure comprises one or more semiconductor devices, each of the semiconductor devices having two or more electrical connections; one or more first conductors connected to a first electrical connection on the semiconductor device, the first conductor comprising a first material having a positive Seebeck coefficient; and one or more second conductors connected to a second electrical connection on the semiconductor device, the second conductor comprising a second material having a negative Seebeck coefficient. The first conductor and the second conductor conduct electrical current through the semiconductor device and conduct heat away from the semiconductor device.

Integrated circuits with Peltier cooling provided by back-end wiring

A system and method for enabling the estimation and mitigation of self-heating in chip designs at a much earlier stage in a design flow. The system and method provides unique characterization of each standard cell in a library for its effective thermal resistance based on the topology and layout of the cell, and brings this per standard cell instance based delta-T to be available for the timing closure tools when completing a synthesized design. Thus, at the timing closure process, the generated design is free of self heating violations. The method computes a unique thermal resistance characterization on per standard cell manner&#x2014;based on the topology, function and layout of the standard cell, and uses that to compute the deltaT per instance of the design. This information is presented to a violation mitigation tool which changes the power levels of the cells, logic function to mitigate the self heating violations.

Early analysis and mitigation of self-heating in design flows

A layout method for a current source array. A digital-to-analog converter (DAC) includes a plurality of complementary metal-oxide-semiconductor (CMOS) devices. Current sources for the CMOS devices are uniformly arranged in a one-dimensional array. The spacing between the current sources in the one-dimensional array is determined using a golden ratio.

Method of optimizing CMOS IDAC linearity performance using golden ratio

Aspects of the present disclosure include a computer-implemented method for designing a temperature-compliant integrated circuit (IC). The method can include: calculating a thermal resistance of an IC layout, the IC layout having an area-dependent thermal conductance, a fin thermal conductance, and a gate thermal conductance each based on a device geometry of a plurality of transistors in the IC layout; calculating a self-heating temperature as directly proportional to the thermal resistance; comparing the self-heating temperature with a threshold temperature; in response to the self-heating temperature exceeding the threshold temperature, automatically modifying the device geometry of the IC layout to reduce at least one of the area term and the perimeter term, thereby reducing the self-heating temperature of the IC layout; and designing the temperature-compliant IC layout by repeating the calculating and automatically modifying steps until the self-heating temperature does not exceed the threshold temperature.

Temperature-compliant integrated circuits

Integrated circuits with peltier cooling provided by back-end wiring

Embodiments include methods, computer systems and computer program products for controlling resistance value of a resistor in a circuit. Aspects include: retrieving, via a controller, a set of parameters of the resistor from a non-volatile memory in the circuit, detecting, via the controller, an operating temperature of the resistor during circuit operation in field using a temperature sensor, generating, by the controller, a temperature difference between the operating temperature detected and a target temperature at which the resistor has a target resistance value, producing, by the controller, a control signal responsive to the temperature difference generated, and transmitting the control signal to a temperature regulator placed adjacent to the resistor to adjust the resistance value of the resistor. The resistance value of the resistor varies in response to temperature changes around the resistor according to a temperature coefficient of the resistance of the resistor.

Methods and control systems of resistance adjustment of resistors

Methods and structures for capacitively isolating a heat shield from a handle wafer of a silicon-on-insulator substrate. A contact plug is located in a trench extending through a trench isolation region in a device layer of the silicon-on-insulator substrate and at least partially through a buried insulator layer of the silicon-on-insulator substrate. The heat shield is located in an interconnect structure, which also includes a wire coupling the heat shield with the contact plug. An isolation structure is positioned between the contact plug and a portion of the handle wafer. The isolation structure provides the capacitive isolation.

High performance heat shields with reduced capacitance

After formation of a gate cavity straddling at least one semiconductor material portion, a gate dielectric layer and at least one work function material layer is formed over the gate dielectric layer. The at least one work function material layer and the gate dielectric layer are patterned such that remaining portions of the at least one work function material layer are present only in proximity to the at least one semiconductor material portion. A conductive material having a greater conductivity than the at least one work function material layer is deposited in remaining portions of the gate cavity. The conductive material portion within a replacement gate structure has the full width of the replacement gate structure in regions from which the at least one work function material layer and the gate dielectric layer are removed.

Replacement gate structure for enhancing conductivity

A buried conductive layer is formed underneath a buried insulator layer of a semiconductor-on-insulator (SOI) substrate. A deep isolation trench laterally surrounding a portion of the buried conductive layer is formed, and is filled with at least a dielectric liner to form a deep capacitor trench isolation structure. Contact via structures are formed through the buried insulator layer and a top semiconductor layer and onto the portion of the buried conductive layer, which constitutes a buried conductive conduit. The deep capacitor trench isolation structure may be formed concurrently with at least one deep trench capacitor. A patterned portion of the top semiconductor layer may be employed as an additional conductive conduit for signal transmission. Further, the deep capacitor trench isolation structure may include a conductive portion, which can be electrically biased to control the impedance of the signal path including the buried conductive conduit.

Buried signal transmission line

The integrated circuit described herein includes: a first resistor having a first trench in a dielectric layer, the first trench having a first width; a second resistor having a second trench in the dielectric layer, the second trench having a second width not equal to the first width; a trench in a dielectric layer, a first conductive layer having a first TCR and coating at least a portion of the first trench and the second trench; and a second conductive layer having a second TCR and coating at least a portion of the first conductive layer in each of the first trench and the second trench, wherein the second TCR is not equal to the first TCR, and wherein the TCR of the IC is selected based on a dimension of the trench, a thickness of the first conductive layer, and a thickness of the second conductive layer.

Multi-layered integrated circuit with selective temperature coefficient of resistance

A gate contact with reduced contact resistance is provided by increasing contact area between the gate contact and a gate conductive portion of a gate structure. The gate contact forms a direct contact with a topmost surface and at least portions of outermost sidewalls of a portion of the gate conductive portion, thus increasing the contact area between the gate contact and the gate structure. The gate contact area of the present application can be further increased by completely surrounding a portion of the gate conductive portion of the gate structure with the gate contact.

CMOS gate contact resistance reduction

A fast FET, a method and system for designing the fast FET and a design structure of the fast FET. The method includes: selecting a reference design for a field effect transistor, the field effect transistor including a source, a drain, a channel between the source and drain, a gate electrode over the channel, at least one source contact to the source and at least one contact to the drain, the at least one source contact spaced a first distance from the gate electrode and the at least one drain contact spaced a second distance from the gate electrode; and adjusting the first distance and the second distance to maximize a performance parameter of the field effect transistor to create a fast design for the field effect transistor.

Growing community of inventors

Burlington, VT, United States of America

Sungjae Lee