Samsung Electronics Co., Ltd.

Sung-Joo An

Jang-Hee Lee

Kaoru Yamamoto

Kee-Young Jun

Geun-O Jeong

Chang-Hyun Kim

Hyeon-jin Shin

Chang-Seok Lee

Hyun-Jae Song

Jeon-Il Lee

Keun-Wook Shin

A semiconductor manufacturing apparatus includes a process chamber. An insulating plate divides an interior space of the process chamber into a first space and a second space and thermally isolates the first space from the second space. A gas supplier is configured to supply a process gas to the first space. A radiator is configured to heat the first space. A stage is disposed within the second space and the stage is configured to support a substrate.

Semiconductor manufacturing apparatus having an insulating plate

In a plasma deposition method, a substrate is loaded onto a substrate stage within a chamber. A first plasma is generated at a region separated from the substrate by a first distance. A first process gas is supplied to the first plasma region to perform a pre-treatment process on the substrate. A second plasma is generated at a region separated from the substrate by a second distance different from the first distance. A second process gas is supplied to the second plasma region to perform a deposition process on the substrate.

Plasma deposition method, plasma deposition apparatus and method of manufacturing semiconductor device

Growing community of inventors

Yongin-si, South Korea

Sung-Joo An