Kla Tencor Corporation

Steve (Yifeng) Cui

Christian Wolters

Anatoly Romanovsky

Bret Whiteside

Donald Pettibone

Chunsheng J Huang

Chuanyong Huang

Chunhai Wang

Methods and systems for reducing illumination intensity while scanning over large particles are presented herein. A surface inspection system determines the presence of a large particle in the inspection path of a primary measurement spot using a separate leading measurement spot. The inspection system reduces the incident illumination power while the large particle is within the primary measurement spot. The primary measurement spot and the leading measurement spot are separately imaged by a common imaging collection objective onto one or more detectors. The imaging based collection design spatially separates the image of the leading measurement spot from the image of the primary measurement spot at one or more wafer image planes. Light detected from the leading measurement spot is analyzed to determine a reduced power time interval when the optical power of the primary illumination beam and the leading illumination beam are reduced.

Surface defect inspection with large particle monitoring and laser power control

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Fremont, CA, United States of America

Steve (Yifeng) Cui