Carl Zeiss Nts Gmbh

Leo Elektronenmikroskopie Gmbh

Stephan Kujawa

Gerd Ludwig Benner

Volker Drexel

Johannes Bihr

Dieter Krahl

A detector system for a particle beam apparatus, in particular for a scanning electron microscope, has a target structure, which in a central region near the optical axis includes an electron-converting material. The target structure also includes either a non-converting material in a region remote from the optical axis or the region remote from the optical axis is offset in the direction of the optical axis with respect to the region near the optical axis that includes the electron-converting material. The detector system makes possible separate detection of only back-scattered electrons or only secondary electrons.

Detector system for a particle beam apparatus, and particle beam apparatus with such a detector system

The invention is directed to an electron microscope having a magnetic energy filter. The energy filter has four deflection regions and seven hexapole correctors for correcting the aberrations of the energy filter. A projection system is mounted downstream of the filter. With the projection system, the achromatic image plane is selectively imaged onto the CCD camera for energy-filtered object imaging or the dispersion plane is imaged on a CCD camera for spectrum detection. For an object registration, the hexapoles are so excited that all geometric aberrations of the second order are corrected in the achromatic image plane and in the dispersion plane. For the spectrum imaging, the excitation of three hexapoles is so changed that the axial chromatic aberration of the filter is corrected while maintaining the correction of the spherical aberration in the achromatic image plane and while maintaining the correction of all geometric errors of the second order in the dispersion plane.

Growing community of inventors

Berlin, Germany

Stephan Kujawa