Carl Zeiss Smt Gmbh

Stephan Andre

Toralf Gruner

Johannes Ruoff

Daniel Golde

Norbert Wabra

Sonja Schneider

Ricarda Schoemer

A projection lens is disclosed for imaging a pattern arranged in an object plane of the projection lens into an image plane of the projection lens via electromagnetic radiation having an operating wavelength &#x3bb; from the extreme ultraviolet range. The projection lens includes a multiplicity of mirrors having mirror surfaces arranged in a projection beam path between the object plane and the image plane so that a pattern of a mask in the object plane is imagable into the image plane via the mirrors. A first imaging scale in a first direction running parallel to a scan direction is smaller in terms of absolute value than a second imaging scale in a second direction perpendicular to the first direction. The projection lens also includes a dynamic wavefront manipulation system for correcting astigmatic wavefront aberration portions caused by reticle displacement.

Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens

Projection exposure method and projection exposure apparatus

Growing community of inventors

Schwaebisch Gmuend, Germany

Stephan Andre