Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Stefan Burkart

Johannes Wangler

Udo Dinger

Nils Haverkamp

Michael Gerhard

Michael Layh

Hartmut Enkisch

Axel Scholz

Berndt Warm

Ralf Scharnweber

Martin Weiser

Stefan Wiesner

Heiko Siekmann

Siegfried Rennon

Andre Bresan

Oliver Wolf

Eva Kalchbrenner

Holger Maltor

Jürgen Baier

Christos Kourouklis

Sigfried Rennon

Günther Dengel

The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.

Optical integrator for an illumination system of a microlithographic projection exposure apparatus

A method for processing the surface of a component, or the processing of an optical element through an ion beam, directed onto the surface to be processed, so that the surface is lowered and/or removed at least partially, wherein the ions have a kinetic energy of 100 keV or more, as well as optical elements processed by the method.

Irradiation with high energy ions for surface structuring and treatment of surface proximal sections of optical elements

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Heidenheim, Germany

Stefan Burkart