Intel Corporation

Sri Chaitra Jyotsna Chavali

Sanka Ganesan

Robert L Sankman

William J Lambert

Siddharth K Alur

Zhichao Zhang

Amanda E Schuckman

Lilia May

Amruthavalli Pallavi Alur

Wei-Lun Kane Jen

Michael J Hill

Zhenguo Jiang

Stephen Andrew Smith

Islam A Salama

Ram S Viswanath

Tarek A Ibrahim

Sriram Srinivasan

Kyu-Oh Lee

Babak Sabi

Shawna M Liff

Debendra Mallik

Srinivas V Pietambaram

Kristof Darmawikarta

Rahul N Manepalli

Robert Alan May

Zhiguo Qian

Kaladhar Radhakrishnan

Kyu Oh Lee

Brandon C Marin

Leonel R Arana

Jeremy D Ecton

Yikang Deng

Sheng C Li

Junnan Zhao

Suddhasattwa Nad

Chong Zhang

Dingying David Xu

Jimin Yao

Frank Truong

Hongxia Feng

Marcel Arlan Wall

Jieying Kong

Cemil S Geyik

Anne Augustine

Arghya Sain

Bohan Shan

David Unruh

Sarah Blythe

Lijiang Wang

Yiyang Zhou

Jason Steill

An inductor can be formed in a coreless electronic substrate, such that the fabrication process does not result in the magnetic material used in the inductor leaching into plating and/or etching solutions/chemistries, and results in a unique inductor structure. This may be achieved by forming conductive vias with a lithographic process, rather than a standard laser process, in combination with panel planarization to prevent exposure of the magnetic material to the plating and/or etching solutions/chemistries.

Coreless electronic substrates having embedded inductors

Various examples provide a semiconductor package. The semiconductor package includes a substrate having first and second opposed substantially planar major surfaces extending in an x-y direction. The package further includes a bridge die having third and fourth opposed substantially planar major surfaces extending in the x-y direction. The third substantially planar major surface of the bridge die is in direct contact with the second substantially planar major surface of the substrate. The semiconductor package further includes a through silicon via extending in a z-direction through the first substantially planar major surface of the substrate and the fourth substantially planar major surface of the bridge die. The semiconductor package further includes a power source coupled to the through silicon via, a first electronic component electronically coupled to the bridge die, and a second electronic component electronically coupled to the bridge die. The semiconductor package further includes an overmold at least partially encasing the first electronic component, second electronic component, and the bridge die.

Embedded die architecture and method of making

Embodiments include inductors and methods to form the inductors. An inductor includes a substrate layer that surrounds a magnetic layer, where the magnetic layer is embedded between the substrate layer. The inductor also includes a dielectric layer that surrounds the substrate and magnetic layers, where the dielectric layer fully embeds the substrate and magnetic layers. The inductor further includes a first conductive layer over the dielectric layer, a second conductive layer below the dielectric layer, and a plurality of plated-through-hole (PTH) vias in the dielectric and substrate layers. The PTH vias vertically extend from the first conductive layer to the second conductive layer, and the magnetic layer in between the PTH vias. The magnetic layer may have a thickness that is substantially equal to a thickness of the substrate layer, where the thickness of the magnetic layer is less than a thickness defined between the first and second conductive layers.

Package embedded magnetic inductor structures and manufacturing techniques for 5-50 MHZ SMPS operations

Generally discussed herein are systems, devices, and methods that include an organic high density interconnect structure and techniques for making the same. According to an example a method can include forming one or more low density buildup layers on a core, conductive interconnect material of the one or more low density buildup layers electrically and mechanically connected to conductive interconnect material of the core, forming one or more high density buildup layers on an exposed low density buildup layer of the one or more low density buildup layers, conductive interconnect material of the high density buildup layers electrically and mechanically connected to the conductive interconnect material of the one or more low density buildup layers, and forming another low density buildup layer on and around an exposed high density buildup layer of the one or more high density buildup layers.

High density organic interconnect structures

An integrated circuit (IC) package substrate, comprising a metallization level within a dielectric material. The metallization level comprises a plurality of conductive features, each having a top surface and a sidewall surface. The top surface of a first conductive feature of the plurality of conductive features has a first average surface roughness, and the sidewall surface of a second conductive feature of the plurality of conductive features has a second average surface roughness that is less than the first average surface roughness.

Selectively roughened copper architectures for low insertion loss conductive features

In accordance with disclosed embodiments, there is an antenna package using a ball attach array to connect an antenna and base substrates of the package. One example is an RF module package including an RF antenna package having a stack material in between a top and a bottom antenna layer to form multiple antenna plane surfaces, a base package having alternating patterned conductive and dielectric layers to form routing through the base package, and a bond between a bottom surface of the antenna package and to a top surface of the base package.

Antenna package using ball attach array to connect antenna and base substrates

Embodiments disclosed herein include electronic packages. In an embodiment, an electronic package comprises a package substrate, wherein the package substrate comprises a first routing architecture. In an embodiment, the electronic package further comprises a first die on the package substrate, a second die on the package substrate, wherein the first die is electrically coupled to the second die by a bridge embedded in the package substrate, and a routing patch on the package substrate. In an embodiment, the routing patch is electrically coupled to the second die, and wherein the routing patch comprises a second routing architecture that is different than the first routing architecture.

Scalable high speed high bandwidth IO signaling package architecture and method of making

Disclosed herein are integrated circuit (IC) structures that may be included in package substrates. For example, disclosed herein are passive components in package substrate, wherein the passive components include at least one non-circular via and at least one pad in contact with the at least one non-circular via, and the passive components include an inductor or a capacitor. Other embodiments are also disclosed.

Integrated circuit structures in package substrates

Embodiments herein describe techniques for a semiconductor device including a package substrate having a core layer. An inductor may include a first coaxial line and a second coaxial line vertically through the core layer, and an interconnect within the package substrate coupling the first coaxial line and the second coaxial line. A first magnetic segment may surround the first coaxial line within the core layer, and a second magnetic segment may surround the second coaxial line within the core layer. In addition, a third magnetic segment may surround the interconnect and be coupled to the first magnetic segment and the second magnetic segment. Other embodiments may be described and/or claimed.

Inductors for package substrates

Embodiments include a package substrate, a semiconductor package, and a method of forming the package substrate. A package substrate includes a core substrate between a first alternate core substrate and a second alternate core substrate. The first alternate core substrate includes conductive layers and vias. The package substrate includes a dielectric layer surrounding the core and first and second alternate substrates, a first conductive layer on a top surface of the dielectric layer, and a second conductive layer on top surfaces of the core and first and second alternate substrates, where the dielectric layer is over/under the core and first and second alternate substrates. The package substrate includes a third conductive layer on bottom surfaces of the core and first and second alternate substrates. The conductive layers are coupled to the vias within the first alternate core substrate, where the conductive layers and vias couple the second and third layers.

Hybrid core substrate architecture for high speed signaling and FLI/SLI reliability and its making

Described are microelectronic devices including a substrate formed with multiple build-up layers, and having at least one build-up layer formed of a fiber-containing material. A substrate can include a buildup layers surrounding an embedded die, or outward of the build-up layer surrounding the embedded die that includes a fiber-containing dielectric. Multiple build-up layers located inward from a layer formed of a fiber-containing dielectric will be formed of a fiber-free dielectric.

Microelectronic device including fiber-containing build-up layers

Disclosed herein are integrated circuit (IC) package substrates formed with a dielectric bi-layer, and related devices and methods. In some embodiments, an IC package substrate is fabricated by: forming a raised feature on a conductive layer; forming a dielectric bi-layer on the conductive layer, where the dielectric bi-layer includes a first sub-layer having a first material property and a second sub-layer having a second material property, and where the top surface of the second sub-layer is substantially planar with the top surface of the raised feature; and removing the first sub-layer until the second material property is detected to reveal the conductive feature. In some embodiments, an IC package substrate is fabricated by: forming a dielectric bi-layer on a patterned conductive layer, where the first sub-layer is less susceptible to removal than the second sub-layer; forming an opening in the dielectric bi-layer; etching; and forming a via having vertical sidewalls.

High density package substrate formed with dielectric bi-layer

Growing community of inventors

Chandler, AZ, United States of America

Sri Chaitra Jyotsna Chavali