Tsinghua University

Siqi Gao

Xin Li

Yu Zhu

Kaiming Yang

Rong Cheng

Ming Zhang

Leijie Wang

Jitao Xu

Jiankun Hao

Yujiao Fan

Disclosed is a scanning interference photolithography system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform and a control subsystem, wherein a substrate is carried on the motion platform, a displacement measurement interferometer is used to measure the displacement of the motion platform, a first light beam and a second light beam are focused on the substrate for interference exposure; the control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light beam and the second light beam. The system has a high precision of fringe pattern locking and a high laser utilization rate, and can be used for producing a large-area high-precision dense grating line gradient periodic grating.

Scanning interference lithographic system

Growing community of inventors

Beijing, China

Siqi Gao