Taiwan Semiconductor Manufacturing Comp. Ltd.

Shui-Tien Lin

Yi-Chuan Lo

Chih-Wei Hsu

Chih-Wei Chen

Shin-Rung Lu

Kuang-Huan Hsu

Hui-Chen Chu

Chen-Yu Chang

Chih-Tsung Lin

Span Lu

Chen-Yung Lin

Hui-Wen Yang

Fu-Ching Yang

Jimmy Hu

A method for photolithography in semiconductor device manufacturing comprises defining test critical dimension target for a photolithography mask, measuring a mask critical dimension, comparing mask critical dimension to the test critical dimension target and determining a critical dimension deviation, determining a photolithography light base energy in response to the critical dimension deviation, and exposing the wafer according to the photolithography light base energy.

System and method for photolithography in semiconductor manufacturing

A method of offline measurement for process tool monitoring applied to semiconductor processes. A self-tuning monitor rule database, storing predefined monitor rules for lot processing is provided. Monitor data related to the lot processing is defined. Desired monitor data is obtained according to selected monitor rules residing in the self-tuning monitor rule database. Offline measurement operations are implemented according to the obtained monitor data using a process tool to generate monitor results. It is determined whether abnormal states exist by comparing the selected monitor rules and monitor data according to the monitor results. If so, the lot processing for the process tool is terminated. If not, the lot processing for the process tool is allowed. A failure notice is sent in response and the selected monitor rules are re-defined to update the self-tuning monitor rule database.

Methods and systems of offline measurement for process tool monitoring

Provided are a system and method for preventing contamination in a semiconductor manufacturing environment. The method includes comparing one or more attributes associated with a product, such as a substrate, with one or more attributes associated with an operation. If the comparison indicates that the product is not compatible with the operation, then the operation is suspended with respect to the product. If the comparison indicates that the product is compatible with the operation, then the operation is performed on the product.

System and method for process contamination prevention for semiconductor manufacturing

A method system for synchronizing a control chart of an SPC system and equipment performance has a chart model () with new chart properties; a method for calculating a control limit based on a statistical deviation, a synchronization frequency for setting a time for reviewing new data gathered by the SPC system, and a process catalog for categorizing all control charts that control the same process step, such that the control charts are organized for assignment of the same performance based control limit calculated by using statistics formed by data for control limit values of the control charts.

Method and system for synchronizing control limit and equipment performance

An advanced process control method using time interval between lots of a particular product to control the weighting of feedback data is described. A plurality of products are fabricated wherein the products are tracked by the process control method based on product type, for example. Variation in a parameter is detected. The adjustment speed of a process recipe is determined based on a time interval weighting wherein the time interval is defined as the time between processing of lots of the same product type. The process recipe is updated at the determined adjustment speed to decrease variation of the parameter.

Method of using time interval in IC foundry to control feed back system

Growing community of inventors

Hsinchu, Taiwan

Shui-Tien Lin