Tokyo Electron Limited

Shozou Maeda

Koji Yamashita

Mitsunori Nakamori

Mikio Nakashima

Yosuke Kawabuchi

Takuro Masuzumi

Yuusuke Takamatsu

A liquid processing method can remove pure water existing within a pattern of a substrate and replace the pure water with a solvent rapidly. The liquid processing method of supplying the pure water onto the substrate, which is horizontally held and has the pattern formed on a surface thereof, and drying the substrate includes a pure water supplying process of supplying the pure water onto the surface of the substrate; a heated solvent supplying process of supplying, after the pure water supplying process, the solvent in a liquid state, which is heated to a temperature equal to or higher than a boiling point of water, onto the surface of the substrate on which the pure water exists; and a removing process of drying the substrate by removing the solvent form the surface of the substrate.

Liquid processing method, substrate processing apparatus and recording medium

A liquid processing apparatus includes a first line to which a processing liquid pressurized by a pump is sent from a processing liquid supply source; a plurality of second lines into which the pressurized processing liquid flowing through the first line flows; a branch line connected to a branch point on each of the second lines; a liquid processing unit configured to process a substrate with the processing liquid; an orifice provided at an upstream side of the branch point; and a first control valve provided at a downstream side of the branch point. The first control valve changes an amount of the processing liquid flowing to a downstream side of the first control valve to control a pressure of the processing liquid in a section between the orifice of the second line and the first control valve, and to control a flow rate of the processing liquid.

Liquid processing apparatus

Growing community of inventors

Koshi, Japan

Shozou Maeda