Screen Holdings Co., Ltd.

Shoji Kirita

Hiroyuki Ogura

Masahito Kashiyama

Toru Momma

Shogo Yoshida

Junki Nishimura

Hidetoshi Sagawa

Hiroyuki Takeuchi

Satoshi Yamamoto

Shinichi Ogasawara

Authentication information is acquired from a storage medium through near field communication in one authentication device. Whether the authentication information corresponds to one substrate processing apparatus at which the authentication device is provided is determined. In a case where the authentication information corresponds to the one substrate processing apparatus, access information is transmitted from the authentication device through near field communication. An instruction terminal receives the access information through near field communication. The instruction terminal accesses a maintenance instruction device based on the access information, whereby a maintenance screen is displayed on a display of the instruction terminal. The instruction terminal has an operation unit to be operated by a user in order to provide an instruction for performing a maintenance operation.

Maintenance device and maintenance method for substrate processing apparatus

A treating solution supply apparatus which supplies a treating solution for treating a substrate includes a liquid passage for allowing the treating solution to flow therethrough; and a pump including a chamber with a variable volume for receiving and feeding the treating solution from/to the liquid passage, and a chamber driver electrically driven to vary the volume of the chamber. The liquid passage, chamber, and chamber driver are arranged in the stated order laterally.

Treating solution supply apparatus

A chamber has a first opening, a second opening, and a third opening. The second opening is higher in level than the first and third openings, and is located at the highest position of a reservoir. Air bubbles are easily collected around the second opening, higher in level than the third opening, due to buoyancy. Moreover, the chamber includes an upper slope on an upper inner wall thereof such that a sectional area of the chamber becomes smaller toward the highest position of the reservoir. The upper slope causes the air bubbles not to stagnate but to be guided to the second opening along the upper slope. This makes easy discharge of the air bubbles from the chamber.

Pumping apparatus, treatment solution supplying device, and substrate treating apparatus

A chamber has at least three openings, or a first opening, a second opening, and a third opening formed therein that are in communication with a reservoir. The second opening is higher in level than the first opening. The third opening is used for discharging a liquid within the reservoir by introducing gas through at least one of the first opening and the second opening into the reservoir. Since the third opening is the lowest in level among the three openings, the liquid stored in the reservoir is able to be drained easily.

Pumping apparatus, treatment solution supplying device, substrate treating apparatus, liquid draining method, and liquid replacing method

A pumping apparatus includes a pump chamber, a piston, a motor, and a controller. The controller determines an imaginary terminal point by referring to a dispense command, theoretical information, and a current position of the piston. The controller corrects the imaginary terminal point to a target position by referring to a correction graph. The controller outputs a drive command to the motor for moving the piston from a start position to the target position.

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Kyoto, Japan

Shoji Kirita