International Business Machines Corporation

Shintaro Aoyama

Vijay Narayanan

Hemanth Jagannathan

Robert Daniel Clark

Barry P Linder

Paul Charles Jamison

Cory Wajda

Gert J Leusink

Marinus Hopstaken

Steven Consiglio

In one exemplary embodiment, a method includes: forming at least one first monolayer of first material on a surface of a substrate by performing a first plurality of cycles of atomic layer deposition; thereafter, annealing the formed at least one first monolayer of first material under a first inert atmosphere at a first temperature between about 650&#xb0; C. and about 900&#xb0; C.; thereafter, forming at least one second monolayer of second material by performing a second plurality of cycles of atomic layer deposition, where the formed at least one second monolayer of second material at least partially overlies the annealed at least one first monolayer of first material; and thereafter, annealing the formed at least one second monolayer of second material under a second inert atmosphere at a second temperature between about 650&#xb0; C. and about 900&#xb0; C.

Structures and techniques for atomic layer deposition

Growing community of inventors

Kohfu, Japan

Shintaro Aoyama