Fujitsu Corporation

Shin-ichi Inoue

Yoshimi Shioya

Hiroshi Goto

Takuya Watanabe

Yuji Furumura

Kiyoshi Watanabe

Fumitake Mieno

Takayuki Ohba

Mamoru Maeda

Tsutomu Ogawa

Atsuhiro Tsukune

Masaaki Ichikawa

Yasushi Ohyama

Yasuo Uo-ochi

Yasushi Oyama

Akira Tabuchi

Norihisa Tsuzuki

A method of producing a semiconductor device comprising the steps of: forming a window or contact hole in an insulating layer to expose a portion of a semiconductor substrate or a lower conductor line; forming semiconductor material (silicon) in the window; substituting the material with a metal (tungsten) by reaction of the semiconductor material with a metal compound (WF.sub.6 gas); and forming a conductor line over the metal within the window.

Method of producing a contact plug

A method of selectively depositing tungsten upon a silicon semiconductor substrate. A silicon substrate is coated with a masking film of PSG or SiO.sub.2 that is patterned to provide an opening for forming an electrode or wiring. On a portion of the substrate in the opening, a layer of tungsten having a thickness of approximately 2000 .ANG. is deposited by a CVD method from an atomosphere containing a gaseous mixture of WF.sub.6 and H.sub.2 . During this processing, tungsten nucleuses deposit on the surface of the masking film as well. Before such nucleuses form a film, the deposition processing is discontinued and H.sub.2 gas is fed into the CVD apparatus to produce HF, which etches the surface of the masking film, and thus tungsten nucleuses are removed. The deposition and removal steps are repeated several times until the height of the deposited tungsten and the thickness of the masking film are essentially equal to present a flat surface. Aluminum film is deposited on the flat surface and patterned by lithography. The flat aluminum deposition allows fabrication of accurate and reliable wirings and facilitates production of VLSI of sub-micron order.

Method of selectively depositing tungsten upon a semiconductor substrate

Growing community of inventors

Kawasaki, Japan

Shin-ichi Inoue