International Business Machines Corporation

Shih-Hsien Lo

Jeffrey W Sleight

Chung-Hsun Lin

Ching-Te Kent Chuang

Joel Abraham Silberman

Yu-Shiang Lin

Andres Bryant

Leland Chang

Oki Gunawan

Jae-Joon Kim

Aditya Bansal

Rahul M Rao

Koushik Kumar Das

Matthew R Wordeman

Michael R Scheuermann

Michael P Beakes

In one aspect, a method for forming an electronic device includes the following steps. An ETSOI layer of an ETSOI wafer is patterned into one or more ETSOI segments each of the ETSOI segments having a width of from about 3 nm to about 20 nm. A gate electrode is formed over a portion of the one or more ETSOI segments which serves as a channel region of a transistor, wherein portions of the one or more ETSOI segments extending out from under the gate electrode serve as source and drain regions of the transistor. At least one TSV is formed in the ETSOI wafer adjacent to the transistor. An electronic device is also provided.

Hybrid ETSOI structure to minimize noise coupling from TSV

Hybrid extremely thin silicon-on-insulator (ETSOI) structure to minimize noise coupling from TSV

A static random access memory fabrication array includes at least one p-type field effect transistor, including a gate stack and isolating spacers forming a gate having a gate length Lgate and an effective gate length, Leff and a source and drain region adjacent the gate stack, wherein the source and drain regions are formed from a low extension dose implant that decreases a difference between Lgate and Leff.

Low extension dose implants in SRAM fabrication

Methods for sensing a mechanical stress and methods of making stress sensor integrated circuits. The sensing methods include transferring the mechanical stress from the object to one or more nanowires in a stress sensor or stress sensor circuit and permitting the nanowires to change in length in response to the mechanical stress. An electrical characteristic of the stress sensor or stress sensor circuit, which has a variation correlated with changes in the magnitude of the mechanical stress, is measured and then assessed to determine the stress magnitude. The manufacture methods include electrically connecting nanowire field effect transistors having, as channel regions, one or more nanowires of either a different crystalline orientation or a different body width for the individual nanowires so that an offset output voltage results when mechanical strain is applied to the nanowires.

Nanowire stress sensors and stress sensor integrated circuits, design structures for a stress sensor integrated circuit, and related methods

A static random access memory fabrication method includes forming a gate stack on a substrate, forming isolating spacers adjacent the gate stack, the isolating spacers and gate stack having a gate length, forming a source and drain region adjacent the gate stack, which generates an effective gate length, wherein the source and drain regions are formed from a low extension dose implant that varies a difference between the gate length and the effective gate length.

Stress sensors and stress sensor integrated circuits using one or more nanowire field effect transistors as stress-sensitive elements, as well as design structures for a stress sensor integrated circuit embodied in a machine readable medium for designing, manufacturing, or testing an integrated circuit, and related methods thereof. The stress sensors and stress sensor integrated circuits include one or more pairs of gate-all-around field effect transistors, which include one or more nanowires as a channel region. The nanowires of each of the field effect transistors are configured to change in length in response to a mechanical stress transferred from an object. A voltage output difference from the field effect transistors indicates the magnitude of the transferred mechanical stress.

Nanowire stress sensors, stress sensor integrated circuits, and design structures for a stress sensor integrated circuit

A memory circuit includes a plurality of bit line structures (each including a true and a complementary bit line), a plurality of word line structures intersecting the plurality of bit line structures to form a plurality of cell locations; and a plurality of cells located at the plurality of cell locations. Each of the cells includes a logical storage element, a first access transistor selectively coupling a given one of the true bit lines to the logical storage element, and a second access transistor selectively coupling a corresponding given one of the complementary bit lines to the logical storage element. One or both of the first and second access transistors are configured with asymmetric current characteristics to enable independent enhancement of READ and WRITE margins. Also included within the 6-T scope are one or more design structures embodied in a machine readable medium, comprising circuits as set forth herein.

Enhanced static random access memory stability using asymmetric access transistors and design structure for same

There is provided a method for verifying inter-stratum connectivity for two or more strata to be combined into a 3D chip stack. Each of the two or more strata has 3D elements including active 3D elements, mechanical 3D elements, and dummy 3D elements. The method includes performing a respective 2D layout versus schematic verification on each of the two or more strata with respect to at least the 3D elements to pre-ensure an absence of shorts between the 3D elements when the two or more strata are subsequently stacked into the 3D chip stack. The method further includes checking inter-stratum interconnectivity between each adjacent pair of strata in the 3D chip stack.

3D inter-stratum connectivity robustness

A memory circuit includes a plurality of bit line structures (each including a true and a complementary bit line), a plurality of word line structures intersecting the plurality of bit line structures to form a plurality of cell locations and a plurality of cells located at the plurality of cell locations. Each of the cells includes a logical storage element, a first access transistor selectively coupling a given one of the true bit lines to the logical storage element, and a second access transistor selectively coupling a corresponding given one of the complementary bit lines to the logical storage element. One or both of the first and second access transistors are configured with asymmetric current characteristics to enable independent enhancement of READ and WRITE margins. Also included within the-T scope are one or more design structures embodied in a machine readable medium, comprising circuits as set forth herein.

Disclosed are a multi-threshold CMOS circuit and a method of designing such a circuit. The preferred embodiment combines an MTCMOS scheme and a hybrid SOI-epitaxial CMOS structure. Generally, the logic transistors (both nFET and pFET) are placed in SOI, preferably in a high-performance, high density UTSOI; while the headers or footers are made of bulk epitaxial CMOS devices, with or without an adaptive well-biasing scheme. The logic transistors are based on (100) SOI devices or super HOT, the header devices are in bulk (100) or (110) pFETs with or without an adaptive well biasing scheme, and the footer devices are in bulk (100) NFET with or without an adaptive well biasing scheme.

Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures

Discloses are CMOS circuit designs that combine MTCMOS and hybrid orientation technology to achieve the dual objectives of high performance and low standby leakage power. The invention utilizes novel combinations of a thick-oxide high-VTH PFET header with various gate- and body-biased schemes in HOT technology to significantly reduce the performance penalty associated with conventional PFET headers. A first embodiment of the invention provides a HOT-B high-VTH thick oxide bulk PFET header scheme. This header scheme can be expanded by application of a positive gate bias VPOS (VPOS&#x3e;VDD) to the HOT-B PFET header during standby mode and a negative gate bias VNEG (VNEG&#x3c;GND) in active mode. Another embodiment provides a HOT-A high-VTH thick oxide SOI PFET header scheme. A further embodiment provides a HOT-A body biased high-VTH thick oxide SOI PFET header scheme.

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Mount Kisco, NY, United States of America

Shih-Hsien Lo