Globalfoundries Singapore Pte. Ltd.

Shi Ya Phyllis Lim

Ming Zhu

Pinghui Li

Yiang Aun Nga

LDMOS transistor structures and integrated circuits including LDMOS transistor structures are provided. An exemplary integrated circuit including an LDMOS transistor structure includes a substrate including a first region and a second region. The substrate includes a bulk layer and, in the second region, an insulator layer overlying the bulk layer and a semiconductor layer overlying the insulator layer. The integrated circuit further includes a gate structure overlying the semiconductor layer. A channel region is formed in the semiconductor layer under the gate structure. The integrated circuit also includes a well contact region on the bulk layer in the first region, a source region overlying the substrate, and a drain region overlying the substrate. A drift region is located between the drain region and the gate structure.

LDMOS transistor structures and integrated circuits including LDMOS transistor structures

Integrated circuits including LDMOS transistor structures and methods for fabricating LDMOS transistor structures are provided. An exemplary method for fabricating an LDMOS transistor structure includes providing a semiconductor-on-insulator (SOI) substrate including a semiconductor layer overlying an insulator layer overlying a bulk layer. The method includes forming a gate structure overlying the substrate. A channel region is formed in the semiconductor layer under the gate structure. The method includes forming a source region overlying the substrate. Further, the method includes forming a drain region overlying the substrate. A drift region is located between the drain region and the gate structure. Also, the method includes forming contacts to the gate structure, the source region, and the drain region.

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Singapore, Singapore

Shi Ya Phyllis Lim