Cypress Semiconductor Corporation

Ramtron International Corporation

Fujitsu Corporation

Other

Infineon Technologies LLC

Texas Instruments Corporation

Shan Sun

Fan Chu

Thomas Davenport

John Edward Cronin

George Hickert

Katsuyoshi Matsuura

Alan D DeVilbiss

Takeyasu Saito

Soichiro Ozawa

Tom E Davenport

Hideyuki Noshiro

Jayant Ashokkumar

Donald J Verhaeghe

Joseph S Tandingan

Jesse J Siman

Xiao-Hong Du

Kapil Jain

Bob Sommervold

Edwin Kim

Robert Sommervold

Franklin Brodsky

Krishnaswamy Ramkumar

Ali Keshavarzi

Craig V Taylor

John Anthony Rodriguez

Katsumi Ogi

Hiroto Uchida

Yoshimasa Horii

Glen Richard Fox

Satoru Mihara

Jeffrey Scott Cross

Thurman John Rodgers

Brian Lee Eastep

Kedar Patel

Mitsushi Fujiki

Tsutomu Atsuki

Steven D Traynor

Naoyuki Satoh

John Ortega

Thomas Domokos Hadnagy

Diana L Johnson

Masahisa Ueda

Eric Dale

Kensuke Kegeyama

Gakuji Uozumi

Patrick F O'connell

Patrick O'Connell

A method of operating a memory device that includes the steps of receiving a read command and a target address in a non-volatile memory (NVM) array, in which the NVM array is divided into a plurality of blocks based on row and column addresses, performing a read operation on NVM cells in the target address and coupling an output of each NVM cell read to a sensing circuit, generating a local reference voltage based on a base reference voltage and an adjustment reference voltage corresponding to the target address of the NVM cells being read and a block that the NVM cells belong thereto, and offsetting the base reference voltage with the adjustment reference voltage, and coupling the local reference voltage to the sensing circuit. Other embodiments are also described.

Local reference voltage generator for non-volatile memory

A memory device including a reference voltage (V) generator and method for operating the same to improve memory sensing margin, and extend operational temperature range and life of the device are disclosed. Generally, the device further includes an array of non-volatile memory cells divided into a plurality of blocks, a sensing circuit coupled to the array to receive and compare memory signals therefrom to the Vto read data from the cells. The Local reference voltage generator is configured to provide one of a number of reference voltages to the sensing circuit based on which of the blocks is being read. The array can be divided based on row and column addresses of cells in the blocks. Where the cells include 1T1C ferroelectric random access memory (F-RAM) cells, and the reference voltages are selected based on a lowest P-term or highest U-term of the cells in the block being read.

A method for fabricating a non-volatile, ferroelectric random access memory (F-RAM) device with a reduced number of masking and etching steps is described. In one embodiment, the method includes forming an opening in an insulating layer over a surface of a substrate to expose a portion of the surface, and forming first spacers on sidewalls of the opening. A conductive layer is formed on the portion of the surface exposed in the opening and separated from the first spacers on the sidewalls of the opening by a gap therebetween. A bottom electrode of a ferroelectric capacitor is formed over the conductive layer and in the gap laterally of the conductive layer, a ferroelectric dielectric formed on the bottom electrode between the first spacers, and a top electrode formed on the ferroelectric dielectric.

Method for fabricating a damascene self-aligned ferroelectric random access memory (F-RAM) device structure employing reduced processing steps

A memory device and method of operating the same are disclosed. Generally, the device includes an array of Ferro-electric Random Access Memory cells. Each cell includes a first transistor coupled between a bit-line and a storage node (SN) and controlled by a first wordline (WL), a second transistor coupled between a reference line and the SN and controlled by a second wordline (WL), and a ferro-capacitor coupled between the SN and a plateline. The device further includes a sense-amplifier coupled to the bit-line and reference line, and a processing-element configured to issue control signals to WL, WL, the plateline and the sense-amplifier. The cell is configured and operated to generate a bit-level reference in which a first voltage pulse is applied to the plateline during a read cycle for the data pulse and a second voltage pulse serves as a reference pulse and as a clear pulse.

2T1C ferro-electric random access memory cell

Disclosed herein is an apparatus that includes a ferroelectric capacitor disposed on a damascene barrier film, and fabrication methods thereof. The damascene barrier film includes a hydrogen barrier region and an oxygen barrier region, with the oxygen barrier being in contact with a bottom surface of the ferroelectric capacitor. Other embodiments are also disclosed herein.

Damascene oxygen barrier and hydrogen barrier for ferroelectric random-access memory

Structure and method of fabrication of F-RAM cells are described. The F-RAM cell include ferroelectric capacitors forming over and with a pre-patterned barrier structure which has a planarized/chemically and/or mechanically polished top surface. The pre-patterned barrier structure includes multiple oxygen barriers having a structure of a bottom electrode layer over an oxygen barrier layer. The bottom electrode layer forms at least a part of the bottom electrode of the ferroelectric capacitor formed thereon.

Ferroelectric random-access memory on pre-patterned bottom electrode and oxidation barrier

Structure of F-RAM cells are described. The F-RAM cell include a contact extending through a first dielectric layer on a surface of a substrate. A barrier structure is formed over the contact by depositing and patterning a barrier layer. A second dielectric layer is deposited over the patterned barrier layer and planarized to expose a top surface of the barrier structure. A ferro-stack is deposited and patterned over the barrier structure to form a ferroelectric capacitor. A bottom electrode of the ferroelectric capacitor is electrically coupled to the diffusion region of the MOS transistor through the barrier structure. The barrier layer is conductive so that a bottom electrode of the ferroelectric capacitor is electrically coupled to the contact through the barrier structure. In one embodiment, patterning barrier layer comprises concurrently forming a local interconnect (LI) on a top surface of the first dielectric layer.

Ferroelectric random-access memory with pre-patterned oxygen barrier

A microelectronic system including hydrogen barriers and copper pillars for wafer level packaging and method of fabricating the same are provided. Generally, the method includes: forming an insulating hydrogen barrier over a surface of a first chip; exposing at least a portion of an electrical contact electrically coupled to a component in the first chip by removing a portion of the insulating hydrogen barrier, the component including a material susceptible to degradation by hydrogen; forming a conducting hydrogen barrier over at least the exposed portion of the electrical contact; and forming a copper pillar over the conducting hydrogen barrier. In one embodiment, the material susceptible to degradation is lead zirconate titanate (PZT) and the microelectronic systems device is a ferroelectric random access memory including a ferroelectric capacitor with a PZT ferroelectric layer. Other embodiments are also disclosed.

Hydrogen barriers in a copper interconnect process

An encapsulated ferroelectric capacitor or ferroelectric memory cell includes encapsulation materials adjacent to a ferroelectric capacitor, a ferroelectric oxide (FEO) layer over the encapsulated ferroelectric capacitor, and an FEO encapsulation layer over the ferroelectric oxide to provide protection from hydrogen induced degradation.

Enhanced hydrogen barrier encapsulation method for the control of hydrogen induced degradation of ferroelectric capacitors in an F-RAM process

Non-volatile memory cells including complimentary metal-oxide-semiconductor transistors and embedded ferroelectric capacitor and methods of forming the same are described. In one embodiment, the method includes forming on a surface of a substrate a gate level including a gate stack of a MOS transistor, a first dielectric layer overlying the MOS transistor and a first contact extending through the first dielectric layer from a top surface thereof to a diffusion region of the MOS transistor. A local interconnect (LI) layer is deposited over the top surface of the first dielectric layer and the first contact, a ferro stack including a bottom electrode, a top electrode and ferroelectric layer there between deposited over the LI layer, and the ferro stack and the LI layer patterned to form a ferroelectric capacitor and a LI through which the bottom electrode is electrically coupled to the diffusion region of the MOS transistor.

Methods of fabricating an F-RAM

An apparatus that includes a reference generating circuit configured to generate a reference signal for a non-volatile memory (NVM) device, the reference generating circuit including a first circuit comprising at least one metal-oxide-semiconductor capacitor, the first circuit generating a first signal component of the reference signal, and a second circuit comprising at least one ferroelectric capacitor, the second circuit generating a second signal component of the reference signal, in which the second signal component is temperature dependent.

Hybrid reference generation for ferroelectric random access memory

Method for fabricating ferroelectric random-access memory on pre-patterned bottom electrode and oxidation barrier

A method for a non-volatile, ferroelectric random access memory (F-RAM) device that includes a ferroelectric capacitor aligned with a preexisting structure is described. In one embodiment, the method includes forming an opening in an insulating layer over a contact in a planar surface of a substrate to expose at least a portion of the contact. Next a self-aligned contact (SAC) is formed electrically coupling to the contact, the SAC medially located in the opening and proximal to a sidewall thereof. A ferroelectric spacer is then formed in the opening medially of the SAC, and a top electrode spacer formed in the opening over the insulating cap and medially of the ferroelectric spacer.

Method for fabricating a damascene self-aligned ferroelectric random access memory (F-RAM) having a ferroelectric capacitor aligned with a three dimensional transistor structure

Methods of forming F-RAM cells are described. The method includes forming a contact extending through a first dielectric layer on a surface of a substrate. A barrier structure is formed over the contact by depositing and patterning a barrier layer. A second dielectric layer is deposited over the patterned barrier layer and planarized to expose a top surface of the barrier structure. A ferro-stack is deposited and patterned over the barrier structure to form a ferroelectric capacitor. A bottom electrode of the ferroelectric capacitor is electrically coupled to the diffusion region of the MOS transistor through the barrier structure. The barrier layer is conductive so that a bottom electrode of the ferroelectric capacitor is electrically coupled to the contact through the barrier structure. In one embodiment, patterning barrier layer comprises concurrently forming a local interconnect (LI) on a top surface of the first dielectric layer.

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Monument, CO, United States of America

Shan Sun