Jsr Corporation

Jrs Corporation

Satoshi Ebata

Yong Wang

Noboru Oshima

Yasuo Matsuki

Takashi Imamura

Michitaka Kaizu

Hitoshi Kato

Tomoki Nagai

Yukio Nishimura

Isao Nishimura

Hiroshi Shiho

Yasuaki Yokoyama

Eiji Yoneda

Haruo Iwasawa

Tatsuya Toneri

Takashi Miyamatsu

Yoichiro Maruyama

Hirokazu Niwata

The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein Ris a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; Rto Rare each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5. Among the radiation-sensitive resin compositions, a positive one contains a resin having acid-dissociable groups in addition to the above acid generator, while a negative one contains an alkali-soluble resin and a crosslinking agent in addition to the acid generator.

Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions

A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generator, a photoacid generator comprising the sulfonium salt compound, and a positive-tone radiation-sensitive resin composition containing the photoacid generator. The sulfonium salt compound is shown by the following formula (I), wherein Rrepresents a halogen atom, an alkyl group, a monovalent alicyclic hydrocarbon group, an alkoxyl group, or &#x2014;ORgroup, wherein Ris a monovalent alicyclic hydrocarbon group, Rrepresents a (substituted)-alkyl group or two or more Rgroups form a cyclic structure, p is 0-7, q is 0-6, n is 0-3, and Xindicates a sulfonic acid anion. The positive-tone radiation-sensitive resin composition comprises (A) a photoacid generator of the sulfonium-salt compound and (B) an acid-dissociable group-containing resin.

Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition

A process for producing a cycloolefin addition polymer in which one or more cycloolefin monomers can be (co)polymerized by addition polymerization with a small palladium catalyst amount to produce a cycloolefin addition (co)polymer while attaining high catalytic activity. The process for cycloolefin addition polymer production is characterized by addition-polymerizing one or more cycloolefin monomers comprising a cycloolefin compound represented by a specific formula in the presence of a multi-component catalyst comprising (a) a palladium compound and (b) a specific phosphorus compound.

Process for producing cycloolefin addition polymer

A novel photoacid generator containing a structure of the following formula (I),wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and Zand Zare individually a fluorine atom or a linear or branched perfluoroalkyl group having 1-10 carbon atoms, is provided. When used in a chemically amplified radiation-sensitive resin composition, the photoacid generator exhibits high transparency, comparatively high combustibility, and no bioaccumulation, and produces an acid exhibiting high acidity, high boiling point, moderately short diffusion length in the resist coating, and low dependency to mask pattern density.

Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition

A composition capable of forming a metal ruthenium film and a ruthenium oxide film by a simple application/baking process, a process for forming a metal ruthenium film and a ruthenium oxide film from the composition, a metal ruthenium film and a ruthenium oxide film formed by the process, and electrodes formed of the films. A solution composition comprising a specific ruthenium complex. The coating film of this solution composition is heated in an atmosphere containing no oxygen or an atmosphere containing oxygen to form a metal ruthenium film or a ruthenium oxide film, respectively, and electrodes formed of the films.

Ruthenium film, ruthenium oxide film and process for forming the same

Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiro&lsqb;4.4&rsqb; nonasilane.

Cyclosilane compound, and solution composition and process for forming a silicon film

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Tokyo, Japan

Satoshi Ebata