Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Sangho Yun

Jieun Lee

Chan Soo Hwang

Jaehee Kim

Seunguk Han

Hoju Song

Youngsin Kim

Soonmok Ha

Yoongi Hong

Dongkwan Yang

Youmin Cha

Kijin Park

Sungwoong Joo

Dongkyun Lim

Gyuhyun Lee

An EUV photomask having a main area and a scribe lane area and reflecting EUV light includes a reflective multilayer film and an absorption pattern, wherein the scribe lane area includes first and second lanes, wherein the first lane includes first and second sub-lanes extending in the same direction as an extending direction of the first lane, wherein the first sub-lane includes a first dummy pattern that is a portion of the absorption pattern, and the second sub-lane includes a second dummy pattern that is a portion of the absorption pattern, and when EUV light that is not absorbed by the first and second dummy patterns and is reflected by the reflective multilayer film is irradiated at least twice by overlapping a negative tone photoresist, an amount of light exceeds a threshold dose of light in the negative tone photoresist corresponding to the first lane.

EUV photomask and method of forming mask pattern using the same

A semiconductor device includes a gate structure on a substrate, first and second spacer structures on first and second sidewalls, respectively, opposite to each other of the gate structure, and first and second source/drain layers at upper portions of the substrate adjacent to the first and second sidewalls, respectively, of the gate structure. An upper surface of the gate structure has a height with reference to an upper surface of the substrate being a base level decreasing from a central portion to the first sidewall and substantially constant from the central portion to the second sidewall.

Semiconductor devices having a decreasing height gate structure

An apparatus for manufacturing a display device, the apparatus including a loading chamber configured to receive a substrate from outside, a transfer chamber connected to the loading chamber and including a robot arm configured to transport the substrate, a deposition chamber connected to the transfer chamber and configured to deposit a deposition material onto the substrate after the substrate is transported to the deposition chamber from the transfer chamber, a mask supply chamber connected to the deposition chamber and configured to supply, to the deposition chamber, one of a plurality of masks stacked in the mask supply chamber, and a station connected to the mask supply chamber and configured to supply the plurality of masks, one by one, to the mask supply chamber.

Apparatus and method of manufacturing display device

Growing community of inventors

Yongin-si, South Korea

Sangho Yun