4 Wave, Inc.

Sami C Antrazi

David Alan Baldwin

Anthony Githinji

Methods for depositing an amorphous vanadium oxide (VO) film include vaporizing vanadium from a vanadium source while the a gas containing an oxygen species and a process modifying additive are in the chamber so as to deposit an amorphous VOfilm on the substrate, where x&#x3e;0. The process modifying additive includes a gas flowing into the chamber or vaporized material from a target source. The additive may stabilize the deposition rate of VO, reduce resistivity, improve thickness control, and improve uniformity of thickness and resistivity. The thin film may be a nitrogen-enhanced, amorphous vanadium oxide (VON) film formed on a substrate, where x&#x3e;y&#x3e;0, and the film contains at least 0.2 atomic % nitrogen. The film may be used in a device, such as a thermal or infrared sensor, or more particularly a bolometer.

Growing community of inventors

Fairfax Station, VA, United States of America

Sami C Antrazi