Sony Semiconductor Solutions Corporation

Ryusei Naito

Toshifumi Wakano

Akira Matsumoto

Yusuke Otake

Masahiko Nakamizo

Junpei Yamamoto

Takuya Sano

Kazunobu Ota

A sensor includes a first substrate including at least a first pixel. The first pixel includes an avalanche photodiode to convert incident light into electric charge and includes an anode and a cathode. The cathode is in a well region of the first substrate. The first pixel includes an isolation region that isolates the well region from at least a second pixel that is adjacent to the first pixel. The first pixel includes a hole accumulation region between the isolation region and the well region. The hole accumulation region is electrically connected to the anode.

Photodetector

A sensor includes a first substrate including at least a first pixel. The first pixel includes an avalanche photodiode to convert incident light into electric charge and includes an anode () and a cathode (). The cathode is in a well region () of the first substrate. The first pixel includes an isolation region () that isolates the well region from at least a second pixel that is adjacent to the first pixel. The first pixel includes a hole accumulation region () between the isolation region and the well region. The hole accumulation region is electrically connected to the anode.

The present technology relates to a solid-state imaging device, a manufacturing method of a solid-state imaging device, and an electronic device, in which degradation of transfer characteristics of a photo diode can be suppressed. A floating diffusion is formed to reach the same depth as a layer of a photo diode formed on a silicon substrate, and a transfer transistor gate is formed therebetween. A channel that is opened/closed by control of the transfer transistor gate is formed in the silicon substrate formed with the photo diode. With this configuration, charge accumulated in the photo diode can be transferred to the floating diffusion in a vertical direction relative to the depth direction, and degradation of transfer characteristics caused by elimination of the transfer channel can be suppressed by setting the transfer channel in the depth direction. The present technology can be applied to a solid-state imaging device.

Growing community of inventors

Nagasaki, Japan

Ryusei Naito