Chinese Academy of Sciences

Runzhang Xie

Wei Lu

Peng Wang

Zhen Wang

Fang Wang

Xiaoshuang Chen

Yunfeng Chen

Weida Hu

Fang Zhong

Jinshui Miao

Ting He

The present disclosure provides a momentum-matching and band-alignment van der Waals (vdW) infrared photodetector and a fabrication method thereof. The photodetector includes a substrate, a dielectric layer, a BiOSe layer, a black phosphorus (BP) layer, a metal source and a metal drain. The fabrication method includes: transferring, in a wet manner, the BiOSe layer grown on the mica substrate onto the substrate having the dielectric layer, transferring the mechanically exfoliated BP layer through a micro-region fixed-point transfer device onto the BiOSe layer, and separately fabricating the metal source and the metal drain on the BiOSe layer and the BP layer by processes such as electron beam exposure and electron beam evaporation, thereby forming the momentum-matching and band-alignment vdW infrared photodetector having a vertical structure.

Momentum-matching and band-alignment van der waals (vdW) infrared photodetector and fabrication method thereof

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Shanghai, China

Runzhang Xie