Kla Tencor Corporation

Kla Corporation

Kla-tencor Technologies Corporation

Sandia Corporation

National Technology & Engineering Solutions of Sandia, LLC

Kla-technologies Corporation

Rudy Flores Garcia

Gildardo Rios Delgado

Frances Hill

Katerina Ioakeimidi

Michael Romero

Mehran Nasser-Ghodsi

Oleg Khodykin

Frank Chilese

Brian Ahr

Niles MacDonald

Ming Lun Yu

Zefram Marks

Gary V Lopez Lopez

Alexander Bykanov

Alexey Kuritsyn

Layton Hale

Francis Chilese

Garrett Pickard

Chris Huang

Sergey D Lopatin

Leonard Elliott Klebanoff

Gabor D Toth

Daniel John Rader

Alexander Jozef Gubbens

John R Torczynski

Salam Harb

Matthew Lent

Mohammed Tahmassebpur

Doug Keith Masnaghetti

Joseph Walsh

Michail A Gallis

Khashayar Shadman

Kenneth Krzeczowski

Anthony S Geller

Edgardo Garcia Berrios

Mark Borowicz

Mehran Naser-Ghodsi

Tzu Chin Chuang

Mehdi Vaez-Iravani

Ilya Bezel

Daniel C Wack

Eugene Shifrin

Terry J Johnson

Stuart L Friedman

David Aitan Soltz

Peter Nunan

Tomas Plettner

Robert Haynes

Prashant Aji

William G Schultz

Tzu-Chin Chuang

Konstantin Tsigutkin

Dave Bakker

Sarah Scott

Matthew Hoffman

Mike Romero

Wo-Tak Wu

Muhran Nasser-Ghodsi

Herschel Marchman

Marco Arienti

Yaojun Xu

Michael Lang

Lennie Klebanoff

Ravichandra Jagannath

Michael E Romero

Francis C Chilese

Daniel S Rader

An apparatus includes a lifting device and a motor assembly. The lifting device is disposed in a lifting device housing and is configured to adjust a vertical position of an optical component connected to the lifting device. The motor assembly is disposed in a motor housing and is configured to drive the lifting device to adjust the vertical position of the optical component. The lifting device housing, the motor housing, and the optical component are disposed in an ultra-high vacuum chamber of an enclosure. In the case of motor failure, the motor housing can be disconnected from the lifting device housing, and the motor assembly can be decoupled from the lifting device, such that the motor assembly can be replaced.

Method and apparatus for positioning optical isolator assembly with replaceable motor assembly

Systems and methods for mitigating and reducing contamination of one or more components of overlay inspection systems are disclosed. Specifically, embodiments of the present disclosure may utilize a counterflow of purge gas through a counterflow nozzle to reduce the presence of contaminants within one or more portions of an inspection system. The system may include a source chamber, one or more vacuum chambers, an intermediate focus housing having an aperture, an illumination source configured to generate and direct illumination through the aperture in an illumination direction, and a counterflow nozzle configured to direct a counterflow of purge gas into the source chamber in a direction opposite the illumination direction.

Counterflow gas nozzle for contamination mitigation in extreme ultraviolet inspection systems

The present disclosure is directed to laser produced plasma light sources having a target material, such as xenon, that is coated on the outer surface of a drum. Bearing systems rotate the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

Laser produced plasma light source having a target material coated on a cylindrically-symmetric element

The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed.

Droplet generation for a laser produced plasma light source

An actuator for an optic mount in a vacuum environment includes a bellows around an actuator compartment. The bellows provides a seal around the actuator. A filter assembly is positioned between the actuator compartment and an interior of a vacuum chamber. The filter assembly includes a first particle filter, a second particle filter, and a purifier medium between the first particle filter and the second particle filter. Vacuum conditions in the actuator compartment can be achieved with a pump for the vacuum chamber, but particles and contaminants from the actuator or actuator compartment are captured by the filter assembly.

Vacuum actuator containment for molecular contaminant and particle mitigation

The present invention provides a local clean microenvironment near optical surfaces of an extreme ultraviolet (EUV) optical assembly maintained in a vacuum process chamber and configured for EUV lithography, metrology, or inspection. The system includes one or more EUV optical assemblies including at least one optical element with an optical surface, a supply of cleaning gas stored remotely from the one or more optical assemblies and a gas delivery unit comprising: a plenum chamber, one or more gas delivery lines connecting the supply of gas to the plenum chamber, one or more delivery nozzles configured to direct cleaning gas from the plenum chamber to a portion of the EUV assembly, and one or more collection nozzles for removing gas from the EUV optical assembly and the vacuum process chamber.

System and method for cleaning optical surfaces of an extreme ultraviolet optical system

The present disclosure is directed to laser produced plasma light sources having a target material, such as Xenon, that is coated on the outer surface of a drum. Embodiments include bearing systems for rotating the drum that have structures for reducing leakage of contaminant material and/or bearing gas into the LPP chamber. Injection systems are disclosed for coating and replenishing target material on the drum. Wiper systems are disclosed for preparing the target material surface on the drum, e.g. smoothing the target material surface. Systems for cooling and maintaining the temperature of the drum and a housing overlying the drum are also disclosed.

A high-brightness electron beam source is disclosed. The electron beam source may include a broadband illumination source configured to generate broadband illumination. A tunable spectral filter may be configured to filter the broadband illumination to provide filtered illumination having an excitation spectrum. The electron beam source may further include a photocathode configured to emit one or more electron beams in response to the filtered illumination, wherein emission from the photocathode is adjustable based on the excitation spectrum of the filtered illumination from the tunable spectral filter.

System and method for photocathode illumination inspection

A photocathode can include a body fabricated of a wide bandgap semiconductor material, a metal layer, and an alkali halide photocathode emitter. The body may have a thickness of less than 100 nm and the alkali halide photocathode may have a thickness less than 10 nm. The photocathode can be illuminated with a dual wavelength scheme.

Photocathode designs and methods of generating an electron beam using a photocathode

A flat top laser beam is used to generate an electron beam with a photocathode that can include an alkali halide. The flat top profile can be generated using an optical array. The laser beam can be split into multiple laser beams or beamlets, each of which can have the flat top profile. A phosphor screen can be imaged to determine space charge effects or electron energy of the electron beam.

Electron beam generation and measurement

The system includes a photocathode electron source, diffractive optical element, and a microlens array to focus the beamlets. A source directs a radiation beam to the diffractive optical element, which produces a beamlet array to be used in combination with a photocathode surface to generate an array of electron beams from the beamlets.

Photocathode emitter system that generates multiple electron beams

A photocathode structure, which can include one or more of CsTe, CsKTe, CsI, CsBr, GaAs, GaN, InSb, CsKSb, or a metal, has a protective film on an exterior surface. The protective film includes one or more of ruthenium, nickel, platinum, chromium, copper, gold, silver, aluminum, or an alloy thereof. The protective film can have a thickness from 1 nm to 10 nm. The photocathode structure can be used in an electron beam tool like a scanning electron microscope.

Metal encapsulated photocathode electron emitter

An emitter with a diameter of 100 nm or less is used with a protective cap layer and a diffusion barrier between the emitter and the protective cap layer. The protective cap layer is disposed on the exterior surface of the emitter. The protective cap layer includes molybdenum or iridium. The emitter can generate an electron beam. The emitter can be pulsed.

Metal protective layer for electron emitters with a diffusion barrier

An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.

Neutral atom imaging system

Growing community of inventors

Union City, CA, United States of America

Rudy Flores Garcia