Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh

Applied Materials Israel Limited

Technische Universiteit Delft

Roman Barday

Benjamin John Cook

Thomas Kemen

Pieter Kruit

Jürgen Frosien

Dieter Winkler

Ron Naftali

Ralf Schmid

Markus Thomann

A charged particle beam device for irradiating or inspecting a specimen is described. The charged particle beam device includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more primary. Two or more electrodes having one opening, e.g. having one opening each, for the primary charged particle beam or the four or more primary beamlets are provided. The charged particle beam device further includes a collimator for deflecting a first primary beamlet, a second primary beamlet, a third primary beamlet, and a fourth primary beamlet of the four or more primary beamlets with respect to each other. The charged particle beam device further includes an objective lens unit having three or more electrodes, each electrode having openings for the four or more primary beamlets.

Method for inspecting a specimen and charged particle beam device

A charged particle beam apparatus for inspecting a specimen with a plurality of beamlets is described. The charged particle beam apparatus includes a charged particle beam emitter () for generating a charged particle beam () propagating along an optical axis (A) and a multi-beamlet generation- and correction-assembly (), including a first multi-aperture electrode () with a first plurality of apertures for creating the plurality of beamlets from the charged particle beam, at least one second multi-aperture electrode () with a second plurality of apertures of varying diameters for the plurality of beamlets for providing a field curvature correction, and a plurality of multipoles () for individually influencing each of the plurality of beamlets, wherein the multi-beamlet generation- and correction-assembly () is configured to focus the plurality of beamlets to provide a plurality of intermediate beamlet crossovers. The charged particle beam apparatus further includes an objective lens () for focusing each of the plurality of beamlets to a separate location on the specimen, and a single transfer lens () for beamlet collimation arranged between the multi-beamlet generation- and correction-assembly and the objective lens. Further, a method of inspecting a specimen with a charged particle beam apparatus is described.

Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen

A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis (A); an aperture device with a plurality of apertures configured to create a plurality of beamlets from the charged particle beam; and a field curvature corrector. The field curvature corrector includes: a first multi-aperture electrode with a first plurality of openings having diameters that vary as a function of a distance from the optical axis (A); a second multi-aperture electrode with a second plurality of openings; and an adjustment device configured to adjust at least one of a first electrical potential (U1) of the first multi-aperture electrode and a second electrical potential (U2) of the second multi-aperture electrode. Further, a field curvature corrector and methods of operating a charged particle beam device are described.

Charged particle beam device, field curvature corrector, and methods of operating a charged particle beam device

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Poing, Germany

Roman Barday