Centrotherm Photovoltaics Ag

Centrotherm Clean Solutions Gmbh & Xo. Kg

Centrotherm Thermal Solutions Gmbh+co.kg

Robert Michael Hartung

Dieter Zernickel

Volker Kinzig

Rolf Hartung

Reinhard Lenz

Dieter Schmid

Hans-Peter Voelk

Alexander Piechulla

Claus Rade

Andreas Keller

Hans-Peter VÖLK

Hans Reichart

Keim Uwe

Hans Ulrich Völler

A device for doping, deposition or oxidation of semiconductor material at low pressure in a process tube, is provided with a tube closure as well as devices for supplying and discharging process gases and for generating a negative pressure in the process tube. A closure of the process chamber that is gas tight with respect to the process gases and the vacuum tight seal of the end of the tube closure are spatially separated from each other in relation to the atmosphere and are arranged on a same side of the process tube in such a manner that a bottom of a stopper, sealing the process chamber, rests against a sealing rim of the process tube and the tube closure end is sealed vacuum tight by a collar, which is attached to the process tube and against which a door rests sealingly.

Device for doping, deposition or oxidation of semiconductor material at low pressure

A method and device for separation of chalcogens from waste gases in process installations are provided so that complete and reliable removal of chalcogens occurs continuously during nonstop operation of the process installation in the most effective manner possible. The process installation is connected via a pipeline to an input connector of the device for separation of chalcogens arranged outside of the process installation. The pipeline and the input connector have a heat connection to the process chamber. The device for separation of chalcogens is provided with an outlet connector as well as a gas outlet is equipped with a cooling device so that the input connector is excluded from cooling.

Method and apparatus for depositing chalcogens

An assembly is provided for purifying toxic gases from production processes by thermal conversion in a reactor chamber and subsequent treatment of reaction products with a sorption agent in a washing device in order to bind water-soluble reaction products and to elute solid reaction products. The reactor chamber has an external wall and an internal wall, the internal wall tapering at its base in the form of a funnel at a predetermined angle. A unit for thermal treatment of toxic gases is located on the reactor chamber, sealing the top of the chamber. An inner face of the internal wall of the reactor chamber comprises a film of water flowing downwards in a uniform manner. The exterior of the internal wall is surrounded by a cloak of water. A waste gas outlet and a connection for a water circuit are located at the lower end of the tapering internal wall.

Assembly for purifying toxic gases from production processes

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Blaubeuren, Germany

Robert Michael Hartung