Fei Comapny

Robert L Gerlach

Mark Utlaut

Paul P Tesch

Walter Skoczylas

Trevor Dingle

Clive D Chandler

Richard J Young

Lynwood W Swanson

James B McGinn

Mostafa Maazouz

Marek Uncovsky

Michael Ross Scheinfein

Noel Paul Martin

Karel D Van Der Mast

Michael R Scheinfein

Drew Procyk

Locke Christman

Karl D Van Der Mast

Noel A Martin

Mark W Utlaut

A secondary particle detectorfor a charged particle beam systemincludes a scintillatorand a transducer, such as a photomultiplier tube, positioned within a vacuum chamber. Unlike prior art Everhart-Thornley detectors, the photomultiplier is positioned within the vacuum chamber, which improves detection by eliminating optical couplings and provides flexibility in positioning the detector.

In-chamber electron detector

A particle detector switchable from an ion detector to an electron detector includes an ion-to-electron converter and a scintillator detector. With one set of voltages on the components, the converter has minimal impact on the electron trajectories so the electrons are efficiently detected by the scintillator detector. With different voltage settings on the components, the detector can be operated in positive ion mode to collect positive ions with adequate efficiency for most FIB applications. The ion-to-electron converter is preferably in the shape of a cylinder or includes multiple parallel plates

Particle detector suitable for detecting ions and electrons

The present invention provides improved angular aperture schemes for generating shaped beam spots having a desired geometric shape from rectangular, elliptical, and semi-elliptical apertures having one sharp edge. A sharper beam edge can be generated by offsetting the rectangular or elliptical aperture in combination with under or over focus. In the spherical aberration limit, under-focused semi-circle apertures provide a sharp, flat edge. The sharp edge can be made resolute enough for precision milling applications, and at the same time, the spot can be made large enough with enough overall current and current density to efficiently mill away material in either a production or laboratory environment. Depending on the particular beam spot that is desired, combinations of techniques including defocusing, aperture offsetting, and stigmation adjustment, can be used in both spherical aberration dominant and chromatic aberration dominant environments to achieve a desired beam for a desired application.

Angular aperture shaped beam system and method

A method and apparatus for providing a shaped ion beam having low current density and sharp edges. The low current density and sharp edges eliminate the problem of overmilling, while permitting rapid ion beam processing. One method of producing the shaped beam is by using a two lens system, the first lens imaging the source onto the plane of the second lens and the second lens forming an image of the aperture onto the target plane. Another method is to greatly underfocus a chromatic aberration limited beam. Large beams having uniform current density and sharp edges can be produced. A knife edge beam, having a sharp edge can also be produced.

Shaped and low density focused ion beams

A high resolution scanning electron microscope collects secondary Auger electrons through its objective lens to sensitively determine the chemical make-up with extremely fine positional resolution. The system uses a magnetic high resolution objective lens, such as a snorkel lens or a dual pole magnetic lens which provides an outstanding primary electron beam performance. The Auger electrons are deflected from the path of the primary beam by a transfer spherical capacitor. The primary beam is shielded, by a tube or plates, as it traverses the spherical capacitor to prevent aberration of the primary beam and the external wall of the shield maintains a potential gradient related to that of the spherical capacitor to reduce aberration of the primary electron beam. The coaxial configuration of the primary electron beam and the collected secondary electron beam allows the Auger image to coincide with the SEM view.

Collection of secondary electrons through the objective lens of a scanning electron microscope

A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.

Focused ion beam system with coaxial scanning electron microscope

A charged particle beam system uses multiple electron columns to increase throughput. One or more multiple electron emitters are in one or more vacuum sealable gun chambers to allow the gun chamber to be replaced with electrons guns having emitters that have been previously conditioned so that the system does not need to be out of service to condition the newly installed emitters.

Electron beam system using multiple electron beams

A multi-gun FIB system for nanofabrication provides increased throughput at reduced cost while maintaining resolution. Multiple guns are maintained in modular gun chambers that can be vacuum isolated from the primary vacuum chamber containing the targets. A system can include multiple gun chambers, each of which van include multiple guns, with each gun chamber being capable of being vacuum isolated, so that each gun chamber can be removed and replaced without disturbing the vacuum in other gun chambers or in the main chamber. An optical column is associated with each gun. Optical elements for multiple columns can be formed in a bar that extends into several columns. Some of the optical elements are positioned in the gun chambers and others are positioned in the primary vacuum chamber. A through-the-lens secondary particle collection can be used in connection with each of the individual columns.

Multi-column FIB for nanofabrication applications

A portion of an ion optical column is formed using a dielectric bushing to support metallic optical elements, electrically isolate them, and form a vacuum chamber around those elements. In particular, the dielectric bushing is suitable for forming an ion gun vacuum chamber in which are contained an emitter assembly and other optical elements, the gun vacuum chamber preferably being vacuum sealable separately from the system vacuum chamber. A compact ion column includes, within the system vacuum chamber, an automated variable aperture drive mechanism and a gun chamber vacuum isolation valve activation mechanism. Including these mechanisms within the vacuum chamber facilitates the design of multi-beam systems by eliminating mechanical feedthroughs that would interfere with the placement of other components in the vacuum chamber.

Focused ion beam system

An electron source provides electrons that are directed through the final lens of an ion optical column to neutralize at least a portion of the accumulated charge on a sample. The invention can optionally be combined with collection of secondary electrons through the final ion lens. A deflector directs the neutralizing electrons onto the ion beam optical axis and deflects the secondary electrons away from the optical axis for detection. For imaging, a high-pass energy filter separates secondary electrons generated from the neutralizing electron beam from secondary electrons generated by the ion beam.

Through-the-lens neutralization for charged particle beam system

The sensitivity of a secondary ion mass spectrometer (SIMS) is increased by using water vapor to enhance the yield of positive secondary ions sputtered by a primary focused ion beam. Water vapor is injected through a needle that is positioned close to the sample and electrically biased to reduce interference with secondary ion collection field. The sensitivity is enhanced for metals in particular, which tend to be sputtered as positive ions.

Method and apparatus for enhancing yield of secondary ions

A precision electrostatic lens system is formed from lens electrodes having high precision inner bores by aligning said bores on a ceramic rod, inserting segmented glass spacers between adjacent electrodes, and brazing the combination together to provide a monolithic structure capable of maintaining accurate tolerances.

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Portland, OR, United States of America

Robert L Gerlach