Carl Zeiss Smt Gmbh

Technische Universitat Bergakademie Freiberg

Erbicol Sa

Scuola Universitaria Professionale Della Svizzera Italiana

Institut Francais Du Textile Et De L'habillement

Robert Eder

Norbert Wabra

Dimosthenis Trimis

Luca Romelli

Therry Le Blan

Volker Uhlig

Emmanuel Boulet

Alberto Ortona

Sandro Gianella

Claire Chazelas

A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N&#x3e;&#x2212;2 successive sections Ato Aof the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section A, j=1 . . . N and a second optical element is arranged in another section A, k=1 . . . N, the magnitude difference |k&#x2212;j| being an odd number.

Projection objective for a microlithographic projection exposure apparatus

A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N&#x2267;2 successive sections Ato Aof the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section A, j=1 . . . N and a second optical element is arranged in another section A, k=1 . . . N, the magnitude difference |k&#x2212;j| being an odd number.

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Karlsruhe, Germany

Robert Eder