Carl Zeiss Smt Gmbh

Robert Eder

Norbert Wabra

A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N&#x3e;&#x2212;2 successive sections Ato Aof the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section A, j=1 . . . N and a second optical element is arranged in another section A, k=1 . . . N, the magnitude difference |k&#x2212;j| being an odd number.

Projection objective for a microlithographic projection exposure apparatus

A projection objective of a microlithographic projection exposure apparatus contains a plurality of optical elements arranged in N&#x2267;2 successive sections Ato Aof the projection objective which are separated from one another by pupil planes or intermediate image planes. According to the invention, in order to correct a wavefront deformation, at least two optical elements each have an optically active surface locally reprocessed aspherically. A first optical element is in this case arranged in one section A, j=1 . . . N and a second optical element is arranged in another section A, k=1 . . . N, the magnitude difference |k&#x2212;j| being an odd number.

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Karlsruhe, Germany

Robert Eder