Other

Government of the United States of America, As Represented by the Secretary of Commerce

Kla Tencor Corporation

University of Arizona

Wyko, Inc.

Optical Perspectives Group, L.l.c.

Robert E Parks

William P Kuhn

Christopher James Evans

Amin Samsavar

Bryan E Loucks

Roger P Angel

Thomas Harding McWaid

James C Wyant

Chiayu Ai

Michael Weber

James H Burge

Peng Su

Michael R Jacobson

Anthony J Chapek

Robert A Smythe

Lian-Zhen Shao

A non-contact metrology system utilizes a display that can be programmed with a plurality of targets. The display targets shine on a specular surface and the reflected targets are detected by an imaging device. Based on the display pattern and the expected location of the reflected pattern, it is possible to characterize the reflective surface. The displayed pattern can be a regular array of targets and the reflected pattern detected by the imaging device is an irregular display of targets whose locations are based on the particular display pattern, the location of the display system and imaging device and the nature of the surface. Deviations of the actual location of targets from the expected location of targets is indicative of unexpected variations in the surface. Alternatively, the display has an irregular pattern of targets such that the reflected signals result in a regularly spaced array detected by the imaging device.

System and method for non-contact metrology of surfaces

A point source module is provided, comprising: a Shack cube comprising a beam splitter cube with an attached spherical reference surface defining a reference arm; a test arm that is associated with transmission of optical radiation from a source to a sample; a point source of optical radiation whose emissions traverse both the reference arm and the test arm; and a detector associated with a surface of the beam splitter cube and receiving optical radiation from both the reference arm and the test arm and comprising a detector arm, an objective lens associated with the test arm, or both. Further, a method of aligning the point source module is provided, along with a method of using the point source microscope is provided. The apparatus and methods provide a compact, robust device and technique for measuring or locating optical or mechanical datum of parts that are being manufactured or assembled.

Point source module and methods of aligning and using the same

A modular dual-beam source, sample compartment and beam-combining system are provided when used with a monochromator and detector to form a spectrophotometer consisting of: (a) a source module where two ellipsoidal mirrors each produce an image of the light source, and (b) a reflecting sample-compartment module, wherein each side has two plane-mirrors, of the four plane mirrors, three are reference and one is the sample, or (c) a transmission sample-compartment module, wherein each side has two plane-mirrors, and a sample is placed between one pair of plane-mirrors, and (d) a beam-combining module wherein the source images are imaged by a second pair of ellipsoidal mirrors on a reflective chopper that combines the images at a single location that is imaged, external to the module, by another mirror, each module being kinematically located with respect to each other so the system remains optically aligned as modules are interchanged.

Dual beam spectrophotometer modular sample system

A dual field of view optical system and a single, lower cost detector are utilized, rather than using a large CCD camera or multiple CCD cameras, to view a sample that has two or more small areas that need to be measured, which are too far apart to fall on the detector but are within the field of view of the objective, or to measure a long, narrow strip that is too long for the detector, but whose total area is less than the detector area. The dual field of view optical system is employed in a microscope which comprises: (1) an illuminator arm with an illumination source and a field stop, (2) a beam splitter, (3) an objective, (4) a sample plane for location of a sample to be observed, and (5) a detector arm, with the illuminator arm configured to illuminate the sample plane through the beam splitter and the objective and with the detector arm configured to receive an image of the sample and including the dual field of view optical system. The dual field of view optical system comprises two beam splitters, two mirrors and one detector, the two beam splitters in the same plane and the mirrors disposed on either side of the beam splitters, an entrance portion for receiving the image from the sample and an exit portion for directing the image onto the detector.

Dual field of view optical system for microscope, and microscope and interferometer containing the same

The present invention would be a small plastic enclosure having incorporated circuitry and a series of light emitting diodes (LEDS) covered by a plastic lens. The present invention would be designed so that the lights would blink in a random pattern so as to attract attention at night. In addition, a pair of fastening elements would be attached to the side surfaces of the battery compartment in order to assist in securing the battery compartment to the top of a helmet or hat, if so desired. Each of the fastening elements would also contain a plurality of LEDS fixedly mounted on the surface, which would also be connected up to the battery powered unit and would blink randomly. As an option, the present invention would come with an incorporated clip attached to the bottom face of the battery compartment. The present invention could also contain an incorporated hinge fixedly mounted on the bottom face of the battery compartment, which would allow the present invention to be placed on a roadside in an upright position.

Portable safety device

An optical profilometer and a stylus probe measuring device used in the same instrument have the advantage that these two sensors can be quickly switched between each other. This can be an advantage when used to measure samples, since the optical profilometer can be used until a sample is found to be outside of the desired tolerances. Afterwards, the stylus probe measuring device can be used to accurately determine the profile data. This is an advantage because an optical profilometer is relatively quick, and the stylus probe measuring device is relatively accurate. Additionally, since the optical profilometer and stylus probe device are in the same instrument, the X and Y positions of these devices can be interrelated accurately. This allows images to be produced where the positions on the images can be easily correlated. For example, measurement cursors in sensor data displays can correlated by the positional offset information.

Optical profilometer combined with stylus probe measurement device

A polishing lap which is resistant to attack from corrosive and reactive ishing media and which has a surface which is sufficiently resilient to provide good finishes without hindering dimensional controlling and accuracy of the texturing comprises: a lap substrate wherein the surface of the lap substrate has an overall shape and a localized texture; and a replaceable lap film applied to the lap substrate surface and which is deformed to correspond to the localized texture of the lap substrate surface. The polishing lap can be easily reconditioned if contaminated or easily modified for use with different abrasives and polishing media.

Renewable polishing lap

An interferometric apparatus and method are provided for determining a ceal thickness and thickness variations of silicon wafers and other window-like optics. The method includes the steps of (1) emitting a beam of electromagnetic radiation having a diverging wavefront, at an object which is transparent to the radiation, (2) splitting the beam into a reference beam and a test beam, (3) positioning the object in a first position in the test beam to irradiate a central portion of the object, (4) directing the test beam through the central portion, (5) causing the reference beam to interfere with the test beam which has passed through the central portion to form a first interferometric fringe pattern, (6) changing the length of the test beam which has passed through the object until the first interferometric pattern is changed into a desired second interferometric fringe pattern, (7) determining a central thickness of the object in accordance with an amount by which the length of the test beam was changed, (8) moving the object in said test beam to a location in the test beam to irradiate a second portion of the object which is larger than the central portion, (9) causing the reference beam to interfere with the test beam which has passed through the second portion to form a third interferometric fringe pattern, and (10) determining variations relative to the central thickness in accordance with the third interferometric fringe pattern. The method can also be used for measuring thickness variations by taking into account a bow in the object. An interferometer is also provided for carrying out the method.

Interferometric thickness variation test method for windows and silicon

A method and apparatus for measuring an absolute profile of a flat using an interferometer system that includes an interferometer adapted to support two flats, a detection system, and a computer adapted to compute the OPD (optical path difference) between surface of the two flats, wherein a first flat A! having a first surface and a second flat B! having a second surface are supported in the interferometer, with the second surface facing the first surface. The interferometer system measures the OPDs between the first and second surfaces for each pixel. The first flat A! then is rotated by a number of predetermined angles relative to its initial position and each time the OPDs are measured. The first flat A! is rotated to its initial position or 180.degree. therefrom. A third flat C! having a third surface is substituted for the second flat. The OPDs between the first and third surfaces are measured. The first flat A! is replaced by the second flat, with the second surface facing the third in an orientation mirror imaged to its original orientation. The interferometer system is operated to measure the OPDs. The computer solves first, second, and third equations to obtain the entire surface topographies of the first, second, and third surface, wherein each equation is expressed as a sum of even--even, even-odd, odd-even, and odd--odd parts so as to effectuate cancellation of terms, permitting solving of the equations for the surface topography.

Method and apparatus for absolute optical measurement of entire surfaces

A device for covering the sharp, front edge of an exposed hearth, to protect a child who may fall onto the hearth, comprising an elongated frame member having an inner surface which overlies the hearth edge, means for securing the frame member onto the hearth, means for adjusting the length of the frame member and a resilient outer covering for the frame member. Side elements may be attached to each outer end of the frame member so as to cover the side edges of the hearth.

Growing community of inventors

Tucson, AZ, United States of America

Robert E Parks