Varian Associates, Inc.

Robert E Jennings

Eric L Mears

Richard John Hertel

Edward D MacIntosh

Adrian C Delforge

Akhil Bhargava

A load chamber of a load lock is provided with a vertical air curtain which isolates the load chamber from the general clean room environment. Horizontal air flows generated in the load chamber bathe wafers held horizontally in the chamber with filtered air. These horizontal air flows are captured by the air curtain and recirculated to filters which provide horizontal and vertical air flows in the load chamber. If desired, the vertical and horizontal flows may be driven by the air supply mechanism of the clean room itself.

Horizontal laminar air flow work station

Wafer transfer apparatus for horizontal transfer of a wafer between a cassette and an input station of a vacuum processing system includes a wafer transfer arm with a primary section linked to a secondary section so as to move a wafer in a straight line to a location and orientation station and then to the input station. The actual location of the wafer center and the angular orientation of the wafer flat are determined, and the wafer is rotated to a desired angular orientation at the location and orientation station. A solar cell is used to sense actual wafer position by sensing the wafer edge as it is rotated. The required correction and rotation are calculated from the solar cell output. As the wafer is transferred to the input station, correcting displacements are added to the movement so that the wafer is accurately positioned at the input station. A strain gauge is used to reliably sense wafer presence or absence on the transfer arm.

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Andover, MA, United States of America

Robert E Jennings