Siliconware Precision Industries Co., Ltd.

Raymond Jao

Eric Ko

Cheng-Yuan Lai

Chion-Ping Huang

Alex Yang

A fine pitch wafer bumping process comprises: providing a wafer that has a plurality of contact pads exposed by a passivation layer formed on the surface of the wafer, wherein an under bump metal (UBM) is formed respectively on each contact pad; on the surface of the wafer, forming a first mask film having a plurality of first openings that expose respectively the under bump metals (UBM); filling a first solder material respectively in the first openings; reflowing the first solder material into a plurality of solder posts; on the first mask film, forming a second mask film having a plurality of second openings that respectively expose the first openings; filling a second solder material respectively in the second openings; reflowing the second solder material and the first solder posts; removing the first and second mask films; and reflowing the first and second solder posts to form a plurality of bumps.

Fine pitch wafer bumping process

A semiconductor package includes a lead frame having a die pad for a semiconductor chip to be mounted thereon. The die pad is surrounded by a plurality of leads for electrically connecting the semiconductor chip and has one opening formed to decrease the attaching area between the semiconductor chip and the die pad so as to prevent the occurrence of declamination. A base pad is provided to be coupled to the die pad in such a manner that the base pad is positioned underneath or above the die pad and has a bottom surface or a top surface to be exposed to the extension of a resin encapsulant for enclosing the semiconductor chip and a portion of the lead frame, allowing the base pad to serve as a heat dissipater for transferring heat of the semiconductor package to the ambient.

Growing community of inventors

Miaoli Hsien, Taiwan

Raymond Jao