Intel Corporation

Rahul Ramaswamy

Walid M Hafez

Nidhi Nidhi

Hsu-Yu Chang

Han Wui Then

Johann Christian Rode

Marko Radosavljevic

Sansaptak W Dasgupta

Paul B Fischer

Ting Chang

Chia-Hong Jan

Neville L Dias

Roman W Olac-Vaw

Tanuj Trivedi

Jeong Dong Kim

Babak Fallahazad

Chen-Guan Lee

Pei-Chi Liu

Joodong Park

Samuel Jack Beach

Glenn A Glass

Jeng-Ya David Yeh

Curtis Tsai

Gopinath Bhimarasetti

Ayan Kar

Yang Cao

Benjamin Orr

Everett S Cassidy-Comfort

Rohan K Bambery

Daniel B O'Brien

Sandrine Charue-Bakker

Sumit Ashtekar

Hector M Saavedra Garcia

Christopher Alan Nolph

Heli Chetanbhai Vora

Xiaojun Weng

Embodiments disclosed herein include semiconductor devices and methods of forming such devices. In an embodiment, a semiconductor device comprises a substrate, a first transistor over the substrate, where the first transistor comprises a vertical stack of first semiconductor channels, and a first gate dielectric surrounding each of the first semiconductor channels. The first gate dielectric has a first thickness. In an embodiment, the semiconductor device further comprises a second transistor over the substrate, where the second transistor comprises a second semiconductor channel. The second semiconductor channel comprises pair of sidewalls and a top surface. In an embodiment, a second gate dielectric is over the pair of sidewalls and the top surface of the fin, where the second gate dielectric has a second thickness that is greater than the first thickness.

Co-integrated high performance nanoribbon transistors with high voltage thick gate finFET devices

Gate-all-around integrated circuit structures having dual nanowire/nanoribbon channel structures, and methods of fabricating gate-all-around integrated circuit structures having dual nanowire/nanoribbon channel structures, are described. For example, an integrated circuit structure includes a first vertical arrangement of nanowires above a substrate. A dielectric cap is over the first vertical arrangement of nanowires. A second vertical arrangement of nanowires is above the substrate. Individual ones of the second vertical arrangement of nanowires are laterally staggered with individual ones of the first vertical arrangement of nanowires and the dielectric cap.

Gate-all-around integrated circuit structures having dual nanoribbon channel structures

Embodiments disclosed herein include nanowire and nanoribbon devices with non-uniform dielectric thicknesses. In an embodiment, the semiconductor device comprises a substrate and a plurality of first semiconductor layers in a vertical stack over the substrate. The first semiconductor layers may have a first spacing. In an embodiment, a first dielectric surrounds each of the first semiconductor layers, and the first dielectric has a first thickness. The semiconductor device may further comprise a plurality of second semiconductor layers in a vertical stack over the substrate, where the second semiconductor layers have a second spacing that is greater than the first spacing. In an embodiment a second dielectric surrounds each of the second semiconductor layers, and the second dielectric has a second thickness that is greater than the first thickness.

Nanoribbon thick gate devices with differential ribbon spacing and width for SOC applications

Disclosed herein are IC structures, packages, and devices that include Si-based semiconductor material stack monolithically integrated on the same support structure as non-Si transistors or other non-Si-based devices. In some aspects, the Si-based semiconductor material stack may be provided by semiconductor regrowth over an insulator material. Providing a Si-based semiconductor material stack monolithically integrated on the same support structure as non-Si based devices may provide a viable approach to integrating Si-based transistors with non-Si technologies because the Si-based semiconductor material stack may serve as a foundation for forming Si-based transistors.

Integration of Si-based transistors with non-Si technologies by semiconductor regrowth over an insulator material

A device structure includes a first gate on a first fin, a second gate on a second fin, where the second gate is spaced apart from the first gate by a distance. A fuse spans the distance and is in contact with the first gate and the second gate. A first dielectric is between the first fin and the second fin, where the first dielectric is in contact with, and below, the fuse and a second dielectric is between the first gate and the second gate, where the second dielectric is on the fuse.

Integrated fuse in self-aligned gate endcap for FinFET architectures and methods of fabrication

Embodiments disclosed herein include a semiconductor device and methods of forming such a device. In an embodiment, the semiconductor device comprises a substrate and a transistor on the substrate. In an embodiment, the transistor comprises a first gate electrode, where the first gate electrode is part of a first array of gate electrodes with a first pitch. In an embodiment, the first gate electrode has a first average grain size. In an embodiment, the semiconductor device further comprises a component cell on the substrate. In an embodiment, the component cell comprises a second gate electrode, where the second gate electrode is part of a second array of gate electrodes with a second pitch that is larger than the first pitch. In an embodiment, the second gate electrode has a second average grain size that is larger than the first average grain size.

Self-aligned front-end charge trap flash memory cell and capacitor design for integrated high-density scaled devices

Embodiments disclosed herein include semiconductor devices and methods of forming such devices. In an embodiment a semiconductor device comprises a substrate, a source region over the substrate, a drain region over the substrate, and a semiconductor body extending from the source region to the drain region. In an embodiment, the semiconductor body has a first region with a first conductivity type and a second region with a second conductivity type. In an embodiment, the semiconductor device further comprises a gate structure over the first region of the semiconductor body, where the gate structure is closer to the source region than the drain region.

High voltage extended-drain MOS (EDMOS) nanowire transistors

Disclosed herein are IC structures, packages, and devices that include III-N transistor arrangements that may reduce nonlinearity of off-state capacitance of the III-N transistors. In various aspects, III-N transistor arrangements limit the extent of access regions of the transistors, compared to conventional implementations, which may limit the depletion of the access regions. Due to the limited extent of the depletion regions of a transistor, the off-state capacitance may exhibit less variability in values across different gate-source voltages and, hence, exhibit a more linear behavior during operation.

III-N transistor arrangements for reducing nonlinearity of off-state capacitance

Embodiments disclosed herein include semiconductor devices and methods of forming such devices. In an embodiment, a semiconductor device comprises a semiconductor substrate and a source. The source has a first conductivity type and a first insulator separates the source from the semiconductor substrate. The semiconductor device further comprises a drain. The drain has a second conductivity type that is opposite from the first conductivity type, and a second insulator separates the drain from the semiconductor substrate. In an embodiment, the semiconductor further comprises a semiconductor body between the source and the drain, where the semiconductor body is spaced away from the semiconductor substrate.

ESD diode solution for nanoribbon architectures

A transistor is disclosed. The transistor includes a substrate, a superlattice structure that includes a plurality of heterojunction channels, and a gate that extends to one of the plurality of heterojunction channels. The transistor also includes a source adjacent a first side of the superlattice structure and a drain adjacent a second side of the superlattice structure.

Superlattice FINFET with tunable drive current capability

Disclosed herein are IC structures, packages, and devices that include transistors, e.g., III-N transistors, having a source region, a drain region (together referred to as 'source/drain' (S/D) regions), and a gate stack. In one aspect, a contact to at least one of the S/D regions of a transistor may have a width that is smaller than a width of the S/D region. In another aspect, a contact to a gate electrode material of the gate stack of a transistor may have a width that is smaller than a width of the gate electrode material. Reducing the width of contacts to S/D regions or gate electrode materials of a transistor may reduce the overlap area between various pairs of these contacts, which may, in turn, allow reducing the off-state capacitance of the transistor. Reducing the off-state capacitance of III-N transistors may advantageously allow increasing their switching frequency.

III-N transistors with contacts of modified widths

Embodiments disclosed herein include semiconductor devices and methods of forming such devices. In an embodiment, a semiconductor device comprises a substrate, and a first transistor of a first conductivity type over the substrate. In an embodiment, the first transistor comprises a first semiconductor channel, and a first gate electrode around the first semiconductor channel. In an embodiment, the semiconductor device further comprises a second transistor of a second conductivity type above the first transistor. The second transistor comprises a second semiconductor channel, and a second gate electrode around the second semiconductor channel. In an embodiment, the second gate electrode and the first gate electrode comprise different materials.

Single gated 3D nanowire inverter for high density thick gate SOC applications

Embodiments include a transistor and methods of forming such transistors. In an embodiment, the transistor comprises a semiconductor substrate, a barrier layer over the semiconductor substrate; a polarization layer over the barrier layer, an insulating layer over the polarization layer, a gate electrode through the insulating layer and the polarization layer, a spacer along sidewalls of the gate electrode, and a gate dielectric between the gate electrode and the barrier layer.

E-D mode 2DEG FET with gate spacer to locally tune VT and improve breakdown

Disclosed herein are IC structures, packages, and devices that include III-N transistors implementing various means by which their threshold voltage it tuned. In some embodiments, a III-N transistor may include a doped semiconductor material or a fixed charge material included in a gate stack of the transistor. In other embodiments, a III-N transistor may include a doped semiconductor material or a fixed charge material included between a gate stack and a III-N channel stack of the transistor. Including doped semiconductor or fixed charge materials either in the gate stack or between the gate stack and the III-N channel stack of III-N transistors adds charges, which affects the amount of 2DEG and, therefore, affects the threshold voltages of these transistors.

Growing community of inventors

Portland, OR, United States of America

Rahul Ramaswamy